Jeonghyun Hwang

Effect of an AlN buffer layer on the epitaxial growth of InN by molecular-beam epitaxy

The effect of an AlN buffer layer on the epitaxial growth of InN by molecular-beam epitaxy (MBE) is studied. Using an AlN buffer layer can significantly improve the structural and electrical properties of InN. With increasing thickness of the AlN buffer layer, the Hall mobility of InN will monotonically increase while the electron carrier concentration decreases. The surface morphology of the film also improves. A Hall mobility of more than 800 cm2/V s with a carrier concentration of 2–3×1018 cm−3 at room temperature can be routinely obtained on ∼0.1 μm InN film. More importantly, it is found that under optimum growth conditions, by using an AlN buffer layer, InN films with comparable quality can be achieved by the conventional MBE technique compared to InN grown by migration-enhanced epitaxy. Increasing InN thickness also increases Hall mobility.

Improvement on epitaxial grown of InN by migration enhanced epitaxy

Epitaxial growth of InN on (0001) sapphire with an AlN buffer layer was studied by migration-enhanced epitaxy, which is composed of an alternative supply of pure In atoms and N2 plasma. A series of samples were prepared with different substrate temperatures ranging from 360 to 590 °C. As-grown films were characterized by x-ray diffraction (XRD), reflective high-energy electron diffraction, atomic-force microscopy (AFM), and Hall measurements. Both XRD θ–2θ and ω scans show that the full width at half maximum of the (0002) peak nearly continuously decrease with increasing growth temperature, while InN grown at 590 °C shows the poorest surface morphology from AFM. It is suggested that three-dimensional characterization is necessary for an accurate evaluation of the quality of the InN epilayer. Hall mobility as high as 542 cm2/V s was achieved on film grown at ∼500 °C with an electron concentration of 3×1018 cm−3 at room temperature. These results argue against the common view that nitrogen vacancies are res...

Ultrafast relaxation dynamics of hot optical phonons in graphene

Using ultrafast optical pump-probe spectroscopy, we study the relaxation dynamics of hot optical phonons in few-layer and multilayer graphene films grown by epitaxy on silicon carbide substrates and by chemical vapor deposition on nickel substrates. In the first few hundred femtoseconds after photoexcitation, the hot carriers lose most of their energy to the generation of hot optical phonons which then present the main bottleneck to subsequent cooling. Optical phonon cooling on short time scales is found to be independent of the graphene growth technique, the number of layers, and the type of the substrate. We find average phonon lifetimes in the 2.5–2.55 ps range. We model the relaxation dynamics of the coupled carrier-phonon system with rate equations and find a good agreement between the experimental data and the theory. The extracted optical phonon lifetimes agree very well with the theory based on anharmonic phonon interactions.

van der Waals epitaxial growth of graphene on sapphire by chemical vapor deposition without a metal catalyst.

van der Waals epitaxial growth of graphene on c-plane (0001) sapphire by CVD without a metal catalyst is presented. The effects of CH(4) partial pressure, growth temperature, and H(2)/CH(4) ratio were investigated and growth conditions optimized. The formation of monolayer graphene was shown by Raman spectroscopy, optical transmission, grazing incidence X-ray diffraction (GIXRD), and low voltage transmission electron microscopy (LVTEM). Electrical analysis revealed that a room temperature Hall mobility above 2000 cm(2)/V·s was achieved, and the mobility and carrier type were correlated to growth conditions. Both GIXRD and LVTEM studies confirm a dominant crystal orientation (principally graphene [10-10] || sapphire [11-20]) for about 80-90% of the material concomitant with epitaxial growth. The initial phase of the nucleation and the lateral growth from the nucleation seeds were observed using atomic force microscopy. The initial nuclei density was ~24 μm(-2), and a lateral growth rate of ~82 nm/min was determined. Density functional theory calculations reveal that the binding between graphene and sapphire is dominated by weak dispersion interactions and indicate that the epitaxial relation as observed by GIXRD is due to preferential binding of small molecules on sapphire during early stages of graphene formation.

Electrical Characteristics of Multilayer MoS2 FET’s with MoS2/Graphene Heterojunction Contacts

The electrical properties of multilayer MoS2/graphene heterojunction transistors are investigated. Temperature-dependent I-V measurements indicate the concentration of unintentional donors in exfoliated MoS2 to be 3.57 × 10(11) cm(-2), while the ionized donor concentration is determined as 3.61 × 10(10) cm(-2). The temperature-dependent measurements also reveal two dominant donor levels, one at 0.27 eV below the conduction band and another located at 0.05 eV below the conduction band. The I-V characteristics are asymmetric with drain bias voltage and dependent on the junction used for the source or drain contact. I-V characteristics of the device are consistent with a long channel one-dimensional field-effect transistor model with Schottky contact. Utilizing devices, which have both graphene/MoS2 and Ti/MoS2 contacts, the Schottky barrier heights of both interfaces are measured. The charge transport mechanism in both junctions was determined to be either thermionic-field emission or field emission depending on bias voltage and temperature. On the basis of a thermionic field emission model, the barrier height at the graphene/MoS2 interface was determined to be 0.23 eV, while the barrier height at the Ti/MoS2 interface was 0.40 eV. The value of Ti/MoS2 barrier is higher than previously reported values, which did not include the effects of thermionic field emission.

Compositional modulation and optical emission in AlGaN epitaxial films

Compositional, structural, and optical properties of molecular-beam epitaxy grown AlxGa1−xN films were characterized by transmission electron microscopy (TEM), x-ray diffraction, and cathodoluminescence spectroscopy. Spontaneous modulation, phase separation, and band gap reductions were observed to vary systematically with AlN mole fraction across the full alloy series. At low AlN mole fraction (x⩽0.5), AlGaN epilayers display pronounced phase separation. With increasing AlN mole fraction, phase separation is strongly suppressed by the formation of spontaneous modulation which high spatial resolution TEM techniques unambiguously determine to be atomic-scale compositional superlattice. The formation of the spontaneous superlattice is considered responsible for the pronounced reductions in band gaps and emission energies, exceeding several hundred meV for the Al-rich AlGaN, which has been confirmed by band structure calculations.

Deep level defects and doping in high Al mole fraction AlGaN

We have used depth-dependent cathodoluminescence spectroscopy (CLS) and secondary ion mass spectrometry (SIMS) to investigate the nature of deep level defects and their effect on Si doping of high Al mole fraction (25%–100%) AlGaN. SIMS results provide correlations between AlGaN deep level emissions from CLS and elemental impurities distributed through the epitaxial bulk films. The highest Al mole fraction (xAl) samples exhibit deep level optical emissions that correlate with O and C impurities measured by SIMS. These O impurities appear to introduce donors at low and intermediate Al compositions versus deep levels in Al-rich alloys. The CLS energy onset of near band edge peak emissions track the b=1 theoretical band gap for 0⩽xAl⩽0.98 while their peak emissions deviate monotonically. Temperature-dependent CLS reveal an activation energy decrease of the near band edge emission intensity from 54 to 36 meV for xAl>∼0.80. The absence of free carriers for xAl>0.80 is consistent with Si donor compensation due ...

Surface cleaning and annealing effects on Ni∕AlGaN interface atomic composition and Schottky barrier height

Internal photoemission spectroscopy reveals changes in the Schottky barrier height of Ni on AlGaN∕GaN high electron mobility transistor structures with premetallization processing conditions and postmetallization ultrahigh-vacuum annealing. These variations in the internal photoemission Schottky barrier height are correlated with AlGaN near-band-edge emissions from low-energy electron-excited nanoluminescence spectroscopy and Ni∕AlGaN interface impurities by secondary ion mass spectrometry. We show that changes in the Schottky barrier height and the appearance of dual barriers are dominated by changes in the local Al mole fraction. Interfacial oxygen and carbon have secondary but systematic effects as well.

Interfacial zone percolation in concrete: effects of interfacial zone thickness and aggregate shape

Previously, a hard core/soft shell computer model was developed to simulate the overlap and percolation of the interfacial transition zones surrounding each aggregate in a mortar or concrete. The aggregate particles were modelled as spheres with a size distribution representative of a real mortar or concrete specimen. Here, the model has been extended to investigate the effects of aggregate shape on interfacial transition zone percolation, by modelling the aggregates as hard ellipsoids, which gives a dynamic range of shapes from plates to spheres, to fibers. For high performance concretes, the interfacial transition zone thickness will generally be reduced, which will also affect their percolation properties. This paper presents results from a study of the effects of interfacial transition zone thickness and aggregate shape on these percolation characteristics.

Si doping of high-Al-mole fraction AlxGa1−xN alloys with rf plasma-induced molecular-beam-epitaxy

Very high levels of n-type doping of AlxGa1−xN alloys were recently achieved by rf plasma-induced molecular-beam epitaxy on sapphire substrates and Si as a dopant. Electron concentrations were obtained up to 1.25×1020 cm−3 when the Al mole fraction was 50%, and 8.5×1019 cm−3 electrons were measured even when the Al mole fraction was 80%. Other material properties were determined by optical absorption, photoluminescence, cathodoluminescence, x-ray diffraction, and atomic force microscopy measurements and high optical and morphological qualities were shown.