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Jin-Baek Kim

Samsung

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Publication

Featured researches published by Jin-Baek Kim.

Archive | 2002

Light guide plate, liquid crystal display device having the same, and method for displaying an image using the liquid crystal display device

Ik-soo Lee; Jin-Baek Kim

Archive | 2007

Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound

Kyu-Sik Kim; Jin-Baek Kim; Young-ung Ha; Byung-ha Samsung Electronics Co. Ltd. Park; Ji-Young Park; Su-min Samsung Electronics Co. Ltd. Kim

Archive | 2011

Oxetane-containing compound, photoresist composition having the same, method of preparing pattern, and inkjet print head

Kyu-Sik Kim; Ji Young Park; Young-ung Ha; Jin-Baek Kim; Byung-ha Park; Sumin Kim

Archive | 2008

PHOTORESIST COMPOSITION, METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION AND INKJET PRINT HEAD

Jin-Baek Kim; Byung-ha Park; Kyu-Sik Kim; Young-ung Ha; Su-min Kim

Fourth International Symposium Frontiers in Polymer Science | 2015

Fabrication of dually functionalized patterns on a gold surface via inkless micro-contact printing

Seung Min Shin; Jin-Baek Kim; Soo Young Choi

E-MRS 2014 SPRING MEETING | 2014

Ultrahigh Density Sub-10 nm TiO2 Nanosheet Arrays Using Si-Containing Block Copolymer Lithography and Atomic Layer Deposition

Chang-Hong Bak; Se Jin Ku; Gyeong Cheon Jo; Soo Young Choi; Jae Wook Ha; Jin-Baek Kim

Frontiers in Polymer Science 2013 | 2013

Dually patterned self-assembled monolayers via silicon-containing block copolymer lithography on gold substrates and their applications

Seung A Woo; Soo-Young Choi; Chang Hong Bak; Gyeong Cheon Jo; Jin-Baek Kim

한국고분자학회 2010년 추계 학술대회 | 2010

Dually Patterned Self-assembled Monolayer via Si-containing Block Copolymer Lithography on Gold Substrate

Seung A Woo; Sejin Ku; Sumin Kim; Jin-Baek Kim

한국고분자학회 2009년도 추계 학술대회 | 2009

Improved Top Surface Imaging Process for High Aspect Ratio Patterns

Seung A Woo; Ji Young Park; Sumin Kim; Jin-Baek Kim

한국고분자학회 2008년 춘계 학술대회 | 2008

Photo-curable negative resist containing oxetane moieties for MEMS technology

Sumin Kim; Byung Ha Park; Jin-Baek Kim

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Collaboration

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Ji Young Park

KAIST

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Sumin Kim

KAIST

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Kyu-Sik Kim

Samsung

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Seung A Woo

KAIST

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Young-ung Ha

Samsung

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Byung-ha Park

Samsung

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Gyeong Cheon Jo

KAIST

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Soo Young Choi

KAIST

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Byung-ha Samsung Electronics Co. Ltd. Park

Samsung

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Chang Hong Bak

KAIST

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