Jingu Kang

Highly stable and imperceptible electronics utilizing photoactivated heterogeneous sol-gel metal-oxide dielectrics and semiconductors.

Incorporation of Zr into an AlOx matrix generates an intrinsically activated ZAO surface enabling the formation of a stable semiconducting IGZO film and good interfacial properties. Photochemically annealed metal-oxide devices and circuits with the optimized sol-gel ZAO dielectric and IGZO semiconductor layers demonstrate the high performance and electrically/mechanically stable operation of flexible electronics fabricated via a low-temperature solution process.

Ultrahigh Detective Heterogeneous Photosensor Arrays with In‐Pixel Signal Boosting Capability for Large‐Area and Skin‐Compatible Electronics

An ultra-thin and large-area skin-compatible heterogeneous organic/metal-oxide photosensor array is demonstrated which is capable of sensing and boosting signals with high detectivity and signal-to-noise ratio. For the realization of ultra-flexible and high-sensitive heterogeneous photosensor arrays on a polyimide substrate having organic sensor arrays and metal-oxide boosting circuitry, solution-processing and room-temperature alternating photochemical conversion routes are applied.

Large-Scale Organic Single-Crystal Thin Films and Transistor Arrays via the Evaporation-Controlled Fluidic Channel Method

We report a facile and versatile approach for fabricating large-area organic thin film transistor (OTFTs) arrays via a fluidic channel method. Evaporation-controlled fluidic channel-containing organic semiconductors easily produce large-area organic single-crystalline thin films in a quite uniform manner. The unidirectional movement of the meniscus and the subsequent film growth via solvent evaporation inside the fluidic channel correspond to the simulation based on the finite element method. Utilizing this fluidic channel method, we fabricated high-performance 6,13-bis(triisopropylsilylethynyl)pentacene OTFT arrays with average and maximal mobilities of 0.71 and 2.18 cm(2) V(-1) s(-1), respectively, while exhibiting current on:off ratios of >1 × 10(6). We claim that this scalable fluidic channel method offers a competitive way to fabricate high-performance and large-area organic semiconductor devices for a variety of applications.

Water-Mediated Photochemical Treatments for Low-Temperature Passivation of Metal-Oxide Thin-Film Transistors

The low-temperature electrical passivation of an amorphous oxide semiconductor (AOS) thin-film transistor (TFT) is achieved by a deep ultraviolet (DUV) light irradiation-water treatment-DUV irradiation (DWD) method. The water treatment of the first DUV-annealed amorphous indium-gallium-zinc-oxide (a-IGZO) thin film is likely to induce the preferred adsorption of water molecules at the oxygen vacancies and leads to subsequent hydroxide formation in the bulk a-IGZO films. Although the water treatment initially degraded the electrical performance of the a-IGZO TFTs, the second DUV irradiation on the water-treated devices may enable a more complete metal-oxygen-metal lattice formation while maintaining low oxygen vacancies in the oxide films. Overall, the stable and dense metal-oxygen-metal (M-O-M) network formation could be easily achieved at low temperatures (below 150 °C). The successful passivation of structural imperfections in the a-IGZO TFTs, such as hydroxyl group (OH-) and oxygen vacancies, mainly results in the enhanced electrical performances of the DWD-processed a-IGZO TFTs (on/off current ratio of 8.65 × 10(9), subthreshold slope of 0.16 V/decade, an average mobility of >6.94 cm(2) V(-1) s(-1), and a bias stability of ΔVTH < 2.5 V), which show more than a 30% improvement over the simple DUV-treated a-IGZO TFTs.

Scalable Sub-micron Patterning of Organic Materials Toward High Density Soft Electronics

The success of silicon based high density integrated circuits ignited explosive expansion of microelectronics. Although the inorganic semiconductors have shown superior carrier mobilities for conventional high speed switching devices, the emergence of unconventional applications, such as flexible electronics, highly sensitive photosensors, large area sensor array, and tailored optoelectronics, brought intensive research on next generation electronic materials. The rationally designed multifunctional soft electronic materials, organic and carbon-based semiconductors, are demonstrated with low-cost solution process, exceptional mechanical stability, and on-demand optoelectronic properties. Unfortunately, the industrial implementation of the soft electronic materials has been hindered due to lack of scalable fine-patterning methods. In this report, we demonstrated facile general route for high throughput sub-micron patterning of soft materials, using spatially selective deep-ultraviolet irradiation. For organic and carbon-based materials, the highly energetic photons (e.g. deep-ultraviolet rays) enable direct photo-conversion from conducting/semiconducting to insulating state through molecular dissociation and disordering with spatial resolution down to a sub-μm-scale. The successful demonstration of organic semiconductor circuitry promise our result proliferate industrial adoption of soft materials for next generation electronics.

Photochemical Molecular Tailoring for Efficient Diffusion and Reorganization of Organic Nanocrystals for Ultra-Flexible Organic Semiconductor Arrays

Solution-processed organic single crystals with high carrier mobility have been actively investigated for diverse applications such as displays, sensors, and next generation electronics on a flexible platform. However, the lack of precise alignment and growth control of organic single crystals impedes the widespread adoption of organic materials in an industrial perspective. Here, a photochemical modification approach is reported tailoring the solubility and molecular diffusivity of polymeric sacrificial layer and sequential batch-type vapor annealing to implement high-performance (average saturation mobility: 8.01 cm2 V-1 s-1 ) organic single-crystal thin film transistors with large channel width including multiple aligned single crystals. Additionally, the mechanical properties of the organic single crystals are systematically investigated with extreme strain conditions such as bending radius of 150 μm.

1-Dimensional fiber-based field-effect transistors made by low-temperature photochemically activated sol–gel metal-oxide materials for electronic textiles

We report the high performance metal-oxide fiber field-effect transistors (F-FETs) for electronic textiles (e-textiles). By using low-temperature and a solution process, dense, pinhole-free, and relatively uniform metal-oxide layers were successfully deposited on a 1-dimensional fiber substrate. Particularly, the atomic layer deposited aluminum oxide gate dielectric layer, deposited at 100 °C, exhibited an extremely low leakage current density of ∼10−7 A cm−2 and a high breakdown field of 4.1 MV cm−1. Furthermore, the indium oxide F-FETs, which are photochemically activated at a low temperature, showed a field-effect mobility and on/off ratio of 3.7 cm2 V−1 s−1 and >106, respectively, which we believe are the highest performance among fiber-type FETs reported to date. Based on these results, it is believed that the metal-oxide F-FETs may provide a basic building block to accomplish 2-D woven e-textiles in the future, provided further combining with the weaving and interconnection technologies.

Determination of Insulator-to-Semiconductor Transition in Sol-Gel Oxide Semiconductors Using Derivative Spectroscopy

We report a derivative spectroscopic method for determining insulator-to-semiconductor transition during sol-gel metal-oxide semiconductor formation. When an as-spun sol-gel precursor film is photochemically activated and changes to semiconducting state, the light absorption characteristics of the metal-oxide film is considerable changed particularly in the ultraviolet region. As a result, a peak is generated in the first-order derivatives of light absorption (A′) vs. wavelength (λ) plots, and by tracing the peak center shift and peak intensity, transition from insulating-to-semiconducting state of the film can be monitored. The peak generation and peak center shift are described based on photon-energy-dependent absorption coefficient of metal-oxide films. We discuss detailed analysis method for metal-oxide semiconductor films and its application in thin-film transistor fabrication. We believe this derivative spectroscopy based determination can be beneficial for a non-destructive and a rapid monitoring of the insulator-to-semiconductor transition in sol-gel oxide semiconductor formation.

High-performance organic circuits based on precisely aligned single-crystal arrays

In this paper, we demonstrate high-performance organic logic circuits based on precisely controlled organic single-crystal arrays. Well-aligned microrod shaped 2,7-dioctyl[1]benzothieno[3,2-b][1]benzothiophene (C8-BTBT) single-crystal organic thin-film-transistors (OTFTs) were fabricated via solvent mediated molecular tailoring with a polymeric sacrificial layer, exhibiting saturation mobility of >2 cm2 V−1 s−1. Using this approach, precise placement of organic crystal arrays in a controlled orientation was successfully achieved, enabling the fabrication of OTFT-based inverter circuits with a gain of 1.37 (V V−1). Furthermore, it was demonstrated that, by varying the number of single-crystal microrods, the device dimension and corresponding circuit performance can be modulated. A high-performance inverter operation with various interdigitating single-crystal microrod arrays can thus be achieved.

Frequency-Stable Ionic-Type Hybrid Gate Dielectrics for High Mobility Solution-Processed Metal-Oxide Thin-Film Transistors

In this paper, we demonstrate high mobility solution-processed metal-oxide thin-film transistors (TFTs) by using a high-frequency-stable ionic-type hybrid gate dielectric (HGD). The HGD gate dielectric, a blend of sol-gel aluminum oxide (AlOx) and poly(4-vinylphenol) (PVP), exhibited high dielectric constant (ε~8.15) and high-frequency-stable characteristics (1 MHz). Using the ionic-type HGD as a gate dielectric layer, an minimal electron-double-layer (EDL) can be formed at the gate dielectric/InOx interface, enhancing the field-effect mobility of the TFTs. Particularly, using the ionic-type HGD gate dielectrics annealed at 350 °C, InOx TFTs having an average field-effect mobility of 16.1 cm2/Vs were achieved (maximum mobility of 24 cm2/Vs). Furthermore, the ionic-type HGD gate dielectrics can be processed at a low temperature of 150 °C, which may enable their applications in low-thermal-budget plastic and elastomeric substrates. In addition, we systematically studied the operational stability of the InOx TFTs using the HGD gate dielectric, and it was observed that the HGD gate dielectric effectively suppressed the negative threshold voltage shift during the negative-illumination-bias stress possibly owing to the recombination of hole carriers injected in the gate dielectric with the negatively charged ionic species in the HGD gate dielectric.