Johann Greschner
IBM
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Publication
Featured researches published by Johann Greschner.
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents | 2003
Johann Greschner; Thomas Bayer; Samuel Kalt; H. Weiss; Phillip L. Reu; Roxann L. Engelstad; Obert R. Wood; Carey M. Thiel; Michael S. Gordon; Rajinder S. Dhaliwal; Christopher F. Robinson; Hans C. Pfeiffer
Electron Projection Lithography ( EPL) is a leading candidate for the sub-65 nm lithography regime (1),(2). The development of a low-distortion mask is critical to the success of EPL. EPL has traditionally used either a stencil format mask with a single scatterer layer having the pattern represented by voids in the membrane (3), or a continuous membrane format mask with a patterned scatterer layer supported by an unperforated membrane(4).
Archive | 1983
Hans-Joachim Trumpp; Johann Greschner
Archive | 1992
Thomas Bayer; Johann Greschner; Willy Hildenbrand; Bernd Marquart; Roland R. Stöhr; Olaf Wolter
Archive | 1990
Thomas Bayer; Johann Greschner; Georg Kraus; Helga Weiss; Olaf Wolter
Archive | 1981
Johann Greschner; Georg Kraus; Gerhard E. Schmid
Archive | 1987
Urs T. Duerig; James K. Gimewski; Johann Greschner; Wolfgang Dieter Dr. Pohl; Olaf Wolter
Archive | 1988
Johann Bartha; Thomas Bayer; Johann Greschner; Georg Kraus; Gerhard Schmid
Archive | 1983
Harald Bohlen; Helmut Engelke; Johann Greschner; Peter Nehmiz
Archive | 1984
Uwe Behringer; Johann Greschner; Hans-Joachim Trumpp
Archive | 1994
Johann Greschner; Gerhard Schmid; Werner Steiner; Gerhard Trippel; Olaf Wolter
