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John A. Rule

Cymer, Inc.

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Publication

Featured researches published by John A. Rule.

Archive | 2003

Control system for a two chamber gas discharge laser

John P. Fallon; Richard L. Sandstrom; William N. Partlo; Alexander I. Ershov; Toshihiko Ishihara; John Meisner; Richard M. Ness; Paul C. Melcher; John A. Rule; Robert N. Jacques

Archive | 2002

Laser spectral engineering for lithographic process

Ronald L. Spangler; Jacob P Lipcon; John A. Rule; Robert N. Jacques; Armen Kroyan; Ivan Lalovic; Igor V. Fomenkov; John M Algots

Archive | 2002

Base stabilization system

Leonard Lublin; David J. Warkentin; Baruch Pletner; John A. Rule

Archive | 2003

Automatic gas control system for a gas discharge laser

John A. Rule; Thomas Hofmann; Richard G. Morton; Daniel J. W. Brown; Vladimir B. Fleurov; Fedor Trintchouk; Toshihiko Ishihara; Alexander I. Ershov; Christian J. Wittak

Archive | 2003

Method and apparatus for controlling the output of a gas discharge MOPA laser system

John A. Rule; Paolo Zambon

Archive | 2006

Control system for a two chamber gas discharge laser system

John P. Fallon; Richard L. Sandstrom; William N. Partlo; Alexander I. Ershov; Toshihiko Ishihara; John Meisner; Richard M. Ness; Paul C. Melcher; John A. Rule; Robert N. Jacques

Archive | 2006

Procede et appareil de regulation de la sortie d'un systeme laser a decharge de gaz

Omez S Mesina; John A. Rule; Tom A. Watson; Paolo Zambon; Weijie Zheng

Archive | 2003

Systeme de regulation du debit gazeux automatique pour laser a gaz

John A. Rule; Thomas Hofmann; Richard G. Morton; Daniel J. W. Brown; Vladimir B. Fleurov; Fedor Trintchouk; Toshihiko Ishihara; Alexander I. Ershov; Christian J. Wittak

Archive | 2003

Automatisches gasregelsystem für einen gasentladungslaser Automatic gas controlling system for a gas discharge laser

John A. Rule; Thomas Hofmann; Richard G. Morton; Daniel J. W. Brown; Vladimir B. Fleurov; Fedor Trintchouk; Toshihiko Ishihara; Alexander I. Ershov; Christian J. Wittak; James A Carmichael

Archive | 2002

Ingenierie spectrale laser pour procede lithographique

John M Algots; Igor V. Fomenkov; Robert N. Jacques; Armen Kroyan; Ivan Lalovic; Jacob P Lipcon; John A. Rule; Ronald L. Spangler

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Collaboration

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Robert N. Jacques

Massachusetts Institute of Technology

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Alexander I. Ershov

Cymer

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Toshihiko Ishihara

Cymer

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Igor V. Fomenkov

Cymer

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Jacob P Lipcon

Cymer

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John M Algots

Cymer

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Ronald L. Spangler

Cymer

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Armen Kroyan

Cymer

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Christian J. Wittak

Cymer

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Fedor Trintchouk

Cymer

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