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John Skrovan

Micron Technology

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Publication

Featured researches published by John Skrovan.

Archive | 1997

Apparatus and method for conditioning a planarizing substrate used in chemical-mechanical planarization of semiconductor wafers

John Skrovan

Archive | 1997

Polishing pad, methods of manufacturing and use

Karl M. Robinson; Michael A. Walker; John Skrovan

Archive | 1998

Megasonic cleaning methods and apparatus

John Skrovan; Guy F. Hudson

Archive | 2001

Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies

John Skrovan

Archive | 1997

Variable abrasive polishing pad for mechanical and chemical-mechanical planarization

David Q. Wright; John Skrovan

Archive | 1996

Planarization slurry including a dispersant and method of using same

John Skrovan; Karl M. Robinson

Archive | 1998

Planarization method using a slurry including a dispersant

John Skrovan; Karl M. Robinson

Archive | 1998

Apparatus and method for conditioning a planarizing substrate used in mechanical and chemical-mechanical planarization of semiconductor wafers

John Skrovan

Archive | 1996

Planarization fluid composition chelating agents and planarization method using same

John Skrovan; Scott G. Meikle

Archive | 1999

Planarization fluid composition including chelating agents

John Skrovan; Scott G. Meikle

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Collaboration

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Karl M. Robinson

Micron Technology

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Scott G. Meikle

Micron Technology

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Allen McTeer

Micron Technology

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David Q. Wright

Micron Technology

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Guy F. Hudson

Micron Technology

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Michael A. Walker

Micron Technology

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