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Dive into the research topics where Jonathan S. Maikisch is active.

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Featured researches published by Jonathan S. Maikisch.


Applied Optics | 2006

Optimization of anisotropically etched silicon surface-relief gratings for substrate-mode optical interconnects.

Shun-Der Wu; Thomas K. Gaylord; Jonathan S. Maikisch; Elias N. Glytsis

The optimum profiles of right-angle-face anisotropically etched silicon surface-relief gratings illuminated at normal incidence for substrate-mode optical interconnects are determined for TE, TM, and random linear (RL) polarizations. A simulated annealing algorithm in conjunction with the rigorous coupled-wave analysis is used. The optimum diffraction efficiencies of the -1 forward-diffracted order are 37.3%, 67.1%, and 51.2% for TE-, TM-, and RL-polarization-optimized profiles, respectively. Also, the sensitivities to grating thickness, slant angle, and incident angle of the optimized profiles are presented.


Applied Optics | 2007

Optimum parallel-face slanted surface-relief gratings

Jonathan S. Maikisch; Thomas K. Gaylord

Using a combination of rigorous coupled-wave analysis and simulated annealing, parallel-face slanted surface-relief gratings (PFSSRGs) are optimized. For substrate-mode optical interconnects, profiles are presented for both polymer and silicon PFSSRGs for both TE and TM polarizations at normal incidence with grating periods designed to give a 45 degrees output angle in the negative-first forward-diffracted order. The resulting diffraction efficiencies range from 70% to 99%, with a majority of the optimized profiles yielding over 90%. Optimized polymer profiles for TE and TM polarizations exhibit similar high diffraction efficiencies, but the TM profiles generally require greater groove depths. Silicon profiles optimized for TM polarization have greater diffraction efficiencies than those for TE polarization. Profiles that can feasibly be fabricated are identified, and sensitivities to groove depth, filling factor, slant angle, and incident angle are shown to be modest.


Applied Optics | 2012

Compact silicon diffractive sensor: design, fabrication, and prototype.

Jonathan S. Maikisch; Thomas K. Gaylord

An in-plane constant-efficiency variable-diffraction-angle grating and an in-plane high-angular-selectivity grating are combined to enable a new compact silicon diffractive sensor. This sensor is fabricated in silicon-on-insulator and uses telecommunications wavelengths. A single sensor element has a micron-scale device size and uses intensity-based (as opposed to spectral-based) detection for increased integrability. In-plane diffraction gratings provide an intrinsic splitting mechanism to enable a two-dimensional sensor array. Detection of the relative values of diffracted and transmitted intensities is independent of attenuation and is thus robust. The sensor prototype measures refractive index changes of 10(-4). Simulations indicate that this sensor configuration may be capable of measuring refractive index changes three or four orders of magnitude smaller. The characteristics of this sensor type make it promising for lab-on-a-chip applications.


Applied Optics | 2013

Functional demonstration of a compact silicon diffractive sensor for toluene.

Jonathan S. Maikisch; Thomas K. Gaylord

A compact silicon diffractive sensor detecting toluene in solution is demonstrated. This sensor is fabricated in silicon-on-insulator and utilizes a standard telecommunications wavelength. In-plane diffraction gratings enable micrometer-scale device sizes and intensity-based (as opposed to spectral-based) detection for increased integrability. Precise grating design enables 2-D sensor arrays without the addition of separate optical splitters. Detection of the relative diffracted and transmitted intensities is independent of attenuation and is thus robust. This proof-of-concept sensor is shown to measure toluene concentrations as low as 100 parts per million, corresponding to a refractive index change of 3×10(-4). In addition, a linear sensor array with individual sensor addressability and 2-D array capability is demonstrated. The characteristics of this sensor type make it promising for field-deployable lab-on-a-chip applications.


Frontiers in Optics | 2012

Compact Silicon Diffractive Sensor for Toluene

Jonathan S. Maikisch; Thomas K. Gaylord

A compact silicon diffractive sensor for toluene is experimentally demonstrated. A linear portion of a two-dimensional sensor array is prototyped. The configuration features micron-scale device sizes and attenuation-independent intensity-based measurement (as opposed to spectral-based).


Frontiers in Optics | 2010

Compact Silicon Diffractive Sensor Performance

Jonathan S. Maikisch; Thomas K. Gaylord

Simulation, fabrication, and experimental results for the compact silicon diffractive sensor platform are presented. This configuration is independent of interaction length and attenuation and capable of measuring refractive index changes of 10-8without spectral measurement.


Frontiers in Optics | 2009

Compact Silicon-on-Insulator Diffractive Sensor Design

Jonathan S. Maikisch; Thomas K. Gaylord

A compact, integrated silicon-on-insulator optical sensor design based on in-plane diffraction gratings for microfluidic detection of analytes is presented and analyzed. Optimization, characterization, and sensitivity analysis are performed. Preliminary experimental and fabrication results are presented.


Frontiers in Optics | 2008

A Compact Integrated Chemical/Biological Sensor

Jonathan S. Maikisch; Thomas K. Gaylord

A compact, integrated silicon-on-insulator optical sensor design based on in-plane diffraction gratings for microfluidic detection of gaseous and liquid analytes is presented and analyzed. Optimization, characterization, and sensitivity analysis are performed with rigorous coupled-wave analysis.


Frontiers in Optics | 2005

Optimization of Anisotropically Etched Silicon Surface-Relief Gratings for Substrate-Mode Optical Interconnects

Shun-Der Wu; Thomas K. Gaylord; Jonathan S. Maikisch; Elias N. Glytsis

A simulated annealing algorithm in conjunction with the rigorous coupled-wave analysis (RCWA) is applied to determine the optimum profiles of right-angle-face anisotropically etched silicon (Si) gratings. The sensitivities of the optimized profiles are presented.


Archive | 2007

Photo-masks and methods of fabricating surface-relief grating diffractive devices

Thomas K. Gaylord; Justin L. Stay; Jonathan S. Maikisch; James D. Meindl

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Thomas K. Gaylord

Georgia Institute of Technology

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Shun-Der Wu

Georgia Institute of Technology

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Elias N. Glytsis

National Technical University of Athens

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James D. Meindl

Georgia Tech Research Institute

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Justin L. Stay

Georgia Tech Research Institute

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