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Juergen Steinbrenner

Infineon Technologies

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Publication

Featured researches published by Juergen Steinbrenner.

Archive | 2014

Method of forming a trench using epitaxial lateral overgrowth and deep vertical trench structure

Ravi Keshav Joshi; Johannes Baumgartl; Martin Poelzl; Juergen Steinbrenner; Andreas Haghofer; Christoph Gruber; Georg Ehrentraut

Archive | 2015

Passivation Layer and Method of Making a Passivation Layer

Kurt Matoy; Hubert Maier; Christian Krenn; Elfriede Wellenzohn; Helmut Schoenherr; Juergen Steinbrenner; Markus Kahn; Silvana Fister; Christoph Brunner; Herbert Gietler; Uwe Hoeckele

Archive | 2014

SEMICONDUCTOR WAFER AND METHOD FOR PROCESSING A SEMICONDUCTOR WAFER

Gerhard Schmidt; Martin Sporn; Markus Kahn; Juergen Steinbrenner; Ravi Keshav Joshi

Archive | 2017

Self Aligned Silicon Carbide Contact Formation Using Protective Layer

Ravi Keshav Joshi; Romain Esteve; Markus Kahn; Kurt Pekoll; Juergen Steinbrenner; Gerald Unegg

Archive | 2017

Semiconductor Device Having a Metal Adhesion and Barrier Structure and a Method of Forming Such a Semiconductor Device

Frank Hille; Ravi Keshav Joshi; Michael Fugger; Oliver Humbel; Thomas Laska; Matthias Mueller; Roman Roth; Carsten Schaeffer; Hans-Joachim Schulze; Holger Schulze; Juergen Steinbrenner; Frank Umbach

Archive | 2016

Method of Forming a Trench Using Epitaxial Lateral Overgrowth

Ravi Keshav Joshi; Johannes Baumgartl; Martin Poelzl; Juergen Steinbrenner; Andreas Haghofer; Christoph Gruber; Georg Ehrentraut

Archive | 2016

Semiconductor Devices and Method for Forming Semiconductor Devices

Ravi Keshav Joshi; Johannes Baumgartl; Christoph Gruber; Andreas Haghofer; Martin Poelzl; Juergen Steinbrenner

Archive | 2016

Intermediate Layer for Copper Structuring and Methods of Formation Thereof

Ravi Keshav Joshi; Juergen Steinbrenner; Christian Fachmann; Petra Fischer; Roman Roth

Archive | 2015

CONTROLLING THE REFLOW BEHAVIOUR OF BPSG FILMS AND DEVICES MADE THEREOF

Juergen Steinbrenner; Markus Kahn; Helmut Schoenherr; Ravi Keshav Joshi; Heimo Hofer; Martin Poelzl; Harald Huetter

Archive | 2015

METHOD FOR PROCESSING A SEMICONDUCTOR LAYER, METHOD FOR PROCESSING A SILICON SUBSTRATE, AND METHOD FOR PROCESSING A SILICON LAYER

Gerhard Schmidt; Markus Kahn; Christian Maier; Philipp Sebastian Koch; Juergen Steinbrenner

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Collaboration

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Ravi Keshav Joshi

Infineon Technologies

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Markus Kahn

Infineon Technologies

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Martin Poelzl

Infineon Technologies

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Andreas Haghofer

Infineon Technologies

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Christoph Gruber

Infineon Technologies

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Johannes Baumgartl

Infineon Technologies

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Georg Ehrentraut

Infineon Technologies

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Gerhard Schmidt

Infineon Technologies

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Helmut Schoenherr

Infineon Technologies

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Roman Roth

Infineon Technologies

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