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Dive into the research topics where Roman Roth is active.

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Featured researches published by Roman Roth.


Microelectronics Reliability | 2016

Reliability aspects of copper metallization and interconnect technology for power devices

Frank Hille; Roman Roth; Carsten Schäffer; Holger Schulze; Nicolas Heuck; Daniel Bolowski; Karsten Guth; Alexander Ciliox; Karina Rott; Frank Umbach; Martin Kerber

Abstract The introduction of thick copper metallization and topside interconnects as well as a superior die attach technology is improving the performance and reliability of IGBT power transistor technologies significantly. The much higher specific heat capacity and higher thermal conductivity increases the short circuit capability of IGBTs, which is especially important for inverters for drives applications. This opens the potential to further optimize the electrical performance of IGBTs for higher energy efficiency. The change in metallization requires the introduction of a reliable barrier against copper diffusion and copper silicide formation. This requires the development of an efficient test method and reliability assessment according to a robustness validation approach. In addition, the new metallization enables interconnects with copper bond wires, which yield, together with an improved die attach technology, a major improvement in the power cycling capability.


international symposium on power semiconductor devices and ic s | 2016

Power Cu metallization for future power devices — Process integration concept and reliability

Roman Roth; Holger Schulze; Carsten Schäffer; Frank Hille; Frank Umbach; G. Mertens; N. Rohn; D. Bolowski

A novel power Cu front side chip metallization for insulated-gate bipolar transistors (IGBTs) and freewheeling diodes (FWDs) enabling thick Cu wire wedge bonding on active area is reported. In the continuing race to higher power density, main limitations of IGBT power modules are given by short circuit robustness requirements of the IGBT and power cycling capability of the front side Al wedge bond interconnect. Both topics are addressed by Infineons 5th Generation of IGBT with XT joining technology [1, 2] enabling power density steps far beyond 30%. The developed Cu metallization with a special barrier layer structure allows Cu wedge bonding with high yield and extremely high reliability. The paper is describing firstly the device fabrication and secondly a novel reliability testing method (based on wafer level) covering the possible impact of the wire bond process.


international symposium on power semiconductor devices and ic's | 2010

Failure mechanism and improvement potential of IGBT's short circuit operation

Frank Hille; Frank Umbach; Thomas Raker; Roman Roth


Archive | 2006

Semiconductor device and method for producing a semiconductor device

Thomas Gutt; Drik Siepe; Thomas Laska; Michael Melzl; Matthias Stecher; Roman Roth


Archive | 2006

Semiconductor device including a power device with first metal layer and second metal layer laterally spaced apart

Thomas Gutt; Dirk Siepe; Thomas Laska; Michael Melzl; Matthias Stecher; Roman Roth


Archive | 2006

Semiconductor component has metal layer comprising coherent section, and other metal layer is arranged on coherent section of former metal layer, where latter metal layer is structured between layered regions

Thomas Gutt; Thomas Laska; Michael Melzl; Roman Roth; Dirk Siepe; Matthias Stecher


Archive | 2010

Method for Fabricating a Bond

Roman Roth; Dirk Siepe


Archive | 2013

Semiconductor Device Having a Locally Reinforced Metallization Structure and Method for Manufacturing Thereof

Roman Roth; Frank Umbach


Archive | 2009

Verfahren zur Herstellung einer Bondverbindung

Roman Roth; Dirk Siepe


Archive | 2007

Non-punch-through semiconductor device e.g. insulated gate bipolar transistor, has compensation area embedded within neutral drift zone region and provided between weakly doped region of drift zone and back side emitter area

Anton Mauder; Manfred Pfaffenlehner; Roman Roth; Hans-Joachim Schulze

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