俊二郎 篠原

High-Density Helicon Plasma Sources: Basics and Application to Electrodeless Electric Propulsion

The development of unique, high-density helicon plasma sources is described. Characterization of the largest and the smallest source sizes is made along with a discussion of particle production efficiency using Ar gas. Next, we describe an application of helicon sources to plasma propulsion using a new advanced concept without any eroding electrodes, as a review of our Helicon Electrodeless Advanced Thruster (HEAT) project.

大口径マルチスロットアンテナによる均一 ECR プラズマの生成

A uniform ECR plasma is produced with a multi slot antenna of 280mm in diameter. The radial profile of the ion saturation current density is examined as a function of microwave power and pressure. The radial uniformity of the ion saturation current density is within pm3% over 8 inches in diameter for the input microwave power lkW at pressure of 2mTorr. Furthermore, the deposition of a-Si：H films is attempted on glass substrates using mixture SiH4/He. When the microwave power is increased, the thickness of the films increases.