良信 河合

Investigation of VHF Argon Plasma at High Pressure by Balanced Power Feeding Using Laser Thomson Scattering

The dependences of the VHF plasma parameters on the gas pressure and power were examined by using the Laser Thomson scattering method, where the VHF plasma was produced in the high pressure region by the balanced power feeding method. It was found that the balanced power feeding method provides a high electron density plasma with low electron temperature at high pressures. This characteristics were confirmed by calculations using a 2-dimensional simulation code.

大口径マルチスロットアンテナによる均一 ECR プラズマの生成

A uniform ECR plasma is produced with a multi slot antenna of 280mm in diameter. The radial profile of the ion saturation current density is examined as a function of microwave power and pressure. The radial uniformity of the ion saturation current density is within pm3% over 8 inches in diameter for the input microwave power lkW at pressure of 2mTorr. Furthermore, the deposition of a-Si：H films is attempted on glass substrates using mixture SiH4/He. When the microwave power is increased, the thickness of the films increases.