Jun-Rong Chen

Low efficiency droop in blue-green m-plane InGaN/GaN light emitting diodes

We investigated the electroluminescence and relatively external quantum efficiency (EQE) of m-plane InGaN/GaN light emitting diodes (LEDs) emitting at 480 nm to elucidate the droop behaviors in nitride-based LEDs. With increasing the injection current density to 100 A/cm2, the m-plane LEDs exhibit only 13% efficiency droop, whereas conventional c-plane LEDs suffer from efficiency droop at very low injection current density and the EQE of c-plane LEDs decrease to as little as 50% of its maximum value. Our simulation models show that in m-plane LEDs the absence of polarization fields manifest not only the hole distribution more uniform among the wells but also the reduction in electron overflow out of electron blocking layer. These results suggest that the nonuniform distribution of holes and electron leakage current due to strong polarization fields are responsible for the relatively significant efficiency droop of conventional c-plane LEDs.

Effects of Built-In Polarization and Carrier Overflow on InGaN Quantum-Well Lasers With Electronic Blocking Layers

Effects of built-in polarization and carrier overflow on InGaN quantum-well lasers with a ternary AlGaN or a quaternary AlInGaN electronic blocking layer (EBL) have been numerically investigated by employing an advanced device-simulation program. The simulation results indicate that the characteristics of InGaN quantum-well lasers can be improved by using the quaternary AlInGaN EBL. When the aluminum and indium compositions in the AlInGaN EBL are appropriately designed, the built-in charge density at the interface between the InGaN barrier and the AlInGaN EBL can be reduced. Under this circumstance, the electron leakage current and the laser threshold current can obviously be decreased as compared with the laser structure with a conventional AlGaN EBL when the built-in polarization is taken into account in the calculation. Furthermore, the AlInGaN EBL also gives a higher refractive index than the AlGaN EBL, which is a benefit for a higher quantum-well optical confinement factor in laser operations.

Optically Pumped GaN-based Vertical Cavity Surface Emitting Lasers: Technology and Characteristics

We review the fabrication technology and performance characteristics of optically pumped GaN-based vertical cavity surface emitting lasers (VCSELs). Two types of VCSELs with different microcavity structures are described. First type of VCSEL has a hybrid microcavity structure that consists of an epitaxially grown AlN/GaN distributed Bragg reflector (DBR), a GaN active layer with InGaN/GaN multiple quantum wells (MQWs), and a Ta2O5/SiO2 dielectric DBR. Second type of VCSEL has a dielectric DBR microcavity structure that has a similar InGaN/GaN MQWs active layer sandwiched in two dielectric DBRs formed by Ta2O5/SiO2 and TiO2/SiO2. Both types of VCSELs achieved laser action under optical pumping at room temperature with emission wavelength of 448 and 414 nm for hybrid DBR VCSEL and dielectric DBR VCSEL, respectively. Both lasers showed narrow emission linewidth with high degree of polarization and large spontaneous emission coupling factors of about 10-2. In addition, a high characteristic temperature of over 240 K was measured, and a distinct spatially inhomogeneous emission pattern was observed.

Room Temperature Current Injection Polariton Light Emitting Diode with a Hybrid Microcavity

The strong light-matter interaction within a semiconductor high-Q microcavity has been used to produce half-matter/half-light quasiparticles, exciton-polaritons. The exciton-polaritons have very small effective mass and controllable energy-momentum dispersion relation. These unique properties of polaritons provide the possibility to investigate the fundamental physics including solid-state cavity quantum electrodynamics, and dynamical Bose-Einstein condensates (BECs). Thus far the polariton BEC has been demonstrated using optical excitation. However, from a practical viewpoint, the current injection polariton devices operating at room temperature would be most desirable. Here we report the first realization of a current injection microcavity GaN exciton-polariton light emitting diode (LED) operating under room temperature. The exciton-polariton emission from the LED at photon energy 3.02 eV under strong coupling condition is confirmed through temperature-dependent and angle-resolved electroluminescence spectra.

Nanorod epitaxial lateral overgrowth of a-plane GaN with low dislocation density

The crystal quality of a-plane GaN films was improved by using epitaxial lateral overgrowth on a nanorod GaN template. The investigation of x-ray diffraction showed that the strain in a-plane GaN grown on r-plane sapphire could be mitigated. The average threading dislocation density estimated by transmission electron microscopy was reduced from 3×1010 to 3.5×108 cm−2. From the temperature-dependent photoluminescence, the quantum efficiency of the a-plane GaN was enhanced by the nanorod epitaxial lateral overgrowth (NRELOG). These results demonstrated the opportunity of achieving a-plane GaN films with low dislocation density and high crystal quality via NRELOG.

Development of GaN-Based Vertical-Cavity Surface-Emitting Lasers

This paper reviews the fabrication technology and performance characteristics of optically pumped and electrically pumped GaN-based vertical-cavity surface-emitting lasers (VCSELs). The lasing action of optically pumped hybrid GaN-based VCSELs has been observed at room temperature due to the employment of high-quality and high-reflectivity AlN/GaN-based distributed Bragg reflectors in the VCSEL structure. Based on the device structure of the optically pumped hybrid GaN-based VCSELs, we further achieved the lasing action of electrically pumped GaN-based VCSELs under continuous-wave operation at 77 K. The laser has a threshold injection current of 1.4 mA and emits a blue wavelength at 462 nm together with a narrow linewidth of about 0.15 nm. The laser beam has a divergence angle of about 11.7deg with a polarization ratio of 80%. A very strong spontaneous coupling efficiency of 7.5 times 10-2 was measured.

Theoretical and experimental analysis on InAlGaAs/AlGaAs active region of 850-nm vertical-cavity surface-emitting lasers

In this study, the gain-carrier characteristics of In/sub 0.02/Ga/sub 0.98/As and InAlGaAs quantum wells (QWs) of variant In and Al compositions with an emission wavelength of 838 nm are theoretically investigated. More compressive strain, caused by higher In and Al compositions in InAlGaAs QW, is found to provide higher material gain, lower transparency carrier concentration, and transparency radiative current density over the temperature range of 25-95/spl deg/C. To improve the output characteristics and high-temperature performance of 850-nm vertical-cavity surface-emitting laser (VCSEL), In/sub 0.15/Al/sub 0.08/Ga/sub 0.77/As/Al/sub 0.3/Ga/sub 0.7/As is utilized as the active region, and a high-bandgap 10-nm-thick Al/sub 0.75/Ga/sub 0.25/As electronic blocking layer is employed for the first time. The threshold current and slope efficiency of the VCSEL with Al/sub 0.75/Ga/sub 0.25/As at 25/spl deg/C are 1.33 mA and 0.53 W/A, respectively. When this VCSEL is operated at an elevated temperature of 95/spl deg/C, the increase in threshold current is less than 21% and the decrease in slope efficiency is approximately 24.5%. A modulation bandwidth of 9.2 GHz biased at 4 mA is demonstrated.

Characteristics of MOCVD- and MBE-grown InGa(N)As VCSELs

We report our results on InGaNAs/GaAs vertical-cavity surface-emitting lasers (VCSELs) in the 1.3 ?m range. The epitaxial structures were grown on (1?0?0) GaAs substrates by metalorganic chemical vapour deposition (MOCVD) or molecular beam epitaxy (MBE). The nitrogen composition of the InGa(N)As/GaAs quantum-well (QW) active region is 0?0.02. The long-wavelength (up to 1.3 ?m) room-temperature continuous-wave (RT CW) lasing operation was achieved for MBE- and MOCVD-grown VCSELs. For MOCVD-grown devices with n- and p-doped distributed Bragg reflectors (DBRs), a maximum optical output power of 0.74 mW was measured for In0.36Ga0.64N0.006As0.994/GaAs VCSELs. A very low Jth of 2.55 kA cm?2 was obtained for the InGaNAs/GaAs VCSELs. The MBE-grown devices were made with an intracavity structure. Top-emitting multi-mode 1.3 ?m In0.35Ga0.65N0.02As0.98/GaAs VCSELs with 1 mW output power have been achieved under RT CW operation. A Jth of 1.52 kA cm?2 has been obtained for the MBE-grown In0.35Ga0.65N0.02As0.98/GaAs VCSELs, which is the lowest threshold current density reported. The emission characteristics of the InGaNAs/GaAs VCSELs were measured and analysed.

Study of InGaN–GaN Light-Emitting Diodes With Different Last Barrier Thicknesses

This work reports a theoretical and experimental study on the device performance of blue InGaN-GaN light-emitting diodes (LEDs) with different last barrier thicknesses. The experimental results show that the employment of a 25-nm-thick p-type GaN last barrier in GaN LEDs can improve the light output power from 35.6 to 40.2 mW at 50 mA. By using advanced device simulation, it is shown that the effective energy barrier created by the p-type AlGaN electron blocking layer (EBL) is significantly decreased due to the band bending at the interface between GaN last barrier and AlGaN EBL. The use of a p-type GaN last barrier before the growth of AlGaN EBL can provide a higher energy barrier to suppress the electron overflow and then enhance the light output power.

Numerical Study on Optimization of Active Layer Structures for GaN/AlGaN Multiple-Quantum-Well Laser Diodes

Theoretical analysis for different active layer structures is performed to minimize the laser threshold current of the ultraviolet GaN/AlGaN multiple-quantum-well laser diodes by using advanced device simulation. The simulation results show that the lower threshold current can be obtained when the number of quantum wells is two or three and the aluminum composition in the barrier layer is about 10%-12%. This result is attributed to several different effects including electron leakage current, nonuniform carrier distribution, interface charge density induced by spontaneous and piezoelectric polarization, and optical confinement factor. These internal physical mechanisms are investigated by theoretical calculation to analyze the effects of quantum-well number and different aluminum compositions in barrier layer on laser threshold properties. Furthermore, the effect of quantum-well thickness is discussed as well. It is found that the optimal quantum-well thickness is about 3 nm due to the balance of the advantages of a large confinement factor against the disadvantages of significant quantum-confined Stark effect (QCSE).