Kamlesh V. Chauhan

Effect of sputtering pressure on molybdenum oxide thin films prepared by RF magnetron sputtering

The aim of this paper is to investigate the effect of sputtering pressure variation on Molybdenum oxide thin films were deposited by RF reactive magnetron sputtering. The effect of sputtering pressure on structural and wettability properties of molybdenum oxide films was studied. The decrease of sputtering pressure from 4.5Pa to 1.5Pa which led to evolution of (540), (001) and (015) textures of molybdenum oxide. The XRD results show increment of preferred orientation along with (001) plane for deposited molybdenum oxide films. The average crystallite size is within range 10.09nm-27.39nm with decrease of sputtering pressure from 4.5Pa to 1.5Pa. The static contact angle formed by water and surface energy varies as a function of sputtering pressure. The surface roughness increases from 16.886 to 30.16 nm with decrease in sputtering pressure from 4.5Pa to 1.5Pa.The aim of this paper is to investigate the effect of sputtering pressure variation on Molybdenum oxide thin films were deposited by RF reactive magnetron sputtering. The effect of sputtering pressure on structural and wettability properties of molybdenum oxide films was studied. The decrease of sputtering pressure from 4.5Pa to 1.5Pa which led to evolution of (540), (001) and (015) textures of molybdenum oxide. The XRD results show increment of preferred orientation along with (001) plane for deposited molybdenum oxide films. The average crystallite size is within range 10.09nm-27.39nm with decrease of sputtering pressure from 4.5Pa to 1.5Pa. The static contact angle formed by water and surface energy varies as a function of sputtering pressure. The surface roughness increases from 16.886 to 30.16 nm with decrease in sputtering pressure from 4.5Pa to 1.5Pa.

Study the effect of nitrogen flow rate on tribological properties of tantalum nitride based coatings

Tantalum Nitride (TaN) based coatings are well-known for their high temperature stability and chemical inertness. We have studied the effect of nitrogen flow rate variation on the structural and tribological properties of TaN based coating deposited by RF magnetron sputtering process. The nitrogen flow rate was varied from 5 to 30 sccm. X-ray diffractometer (XRD) and Atomic Force Microscopy (AFM) were used to determine structure and surface topography of coating. Pin on disc tribometer was used to determine tribological properties of coating. TaN coated brass and mild steel substrates shows higher wear resistance compared to uncoated substrates of brass and mild steel.Tantalum Nitride (TaN) based coatings are well-known for their high temperature stability and chemical inertness. We have studied the effect of nitrogen flow rate variation on the structural and tribological properties of TaN based coating deposited by RF magnetron sputtering process. The nitrogen flow rate was varied from 5 to 30 sccm. X-ray diffractometer (XRD) and Atomic Force Microscopy (AFM) were used to determine structure and surface topography of coating. Pin on disc tribometer was used to determine tribological properties of coating. TaN coated brass and mild steel substrates shows higher wear resistance compared to uncoated substrates of brass and mild steel.

Examination of various characteristics for sputtered tantalum oxide-nitride thin films deposited at various oxygen flowrates

ABSTRACT Tantalum oxynitride thin films were prepared by reactive sputtering. The argon and nitrogen flow rate were kept stable whereas oxygen flow rate was incremented periodically. The effect of oxygen flow rate on various properties of tantalum oxynitride thin films is reported in this research paper. XRD patterns of tantalum oxynitride thin films displayed peaks commonly as for nano-crystalline materials. Surface topography observed to be smooth and exhibited smaller grain structure. Wettability test showed promising results for hydrophobicity. Wear test was done on uncoated and coated tantalum oxynitride thin films on 10 mm diameter cylindrical pins of brass and mild steel.

Tribological studies of reactive magnetron sputtered titanium aluminium nitride (TiAlN) coatings

Abstract Ternary TiAlN coatings were deposited on brass substrates by magnetron sputtering method. This paper is focused to study the effect of nitrogen:argon (N2:Ar) gas ratio on tribological properties of TiAlN coatings. TiAlN coatings displayed (1 0 1) peak at N2:Ar gas ratio value of 08:02. The evolution of single (1 0 3) peak for TiAlN coating was observed when the N2:Ar gas ratio values were 08:00, 08:02, 08:5.2 and 08:12. The characterization of TiAlN coatings was studied using scanning electron microscope (SEM). The evolution of well-crystalline structure of TiAlN coatings is observed with increase in N2:Ar gas ratio from 08:00 to 08:12. The tribological properties of TiAlN coatings were tested by pin on disc tribometer at different values of load and sliding distance.

Characterization of sputtered zirconium nitride films deposited at various argon:nitrogen ratio

Zirconium nitride films were deposited by reactive magnetron sputtering using argon as inert gas and nitrogen as reactive gas. The nitrogen flow rate in argon:nitrogen ratio was increased from 4sccm to 20sccm by an increment of 4sccm. The effect of increment in nitrogen flow rate on various properties of deposited zirconium nitride films are reported in this paper. The structural characterization was done by X-Ray diffraction which confirms (011) peak of Zr3N4 and a very low intensity (111) peak of Zr3N4. Optical properties was investigated by Uv-Vis-NIR spectrophotometer which showed that the films were transparent and maximum transmittance observed was around 82%. The wettability properties was investigated by contact angle goniometer which showed the films were hydrophobic and maximum contact angle achieved was 99.50.

Modelling and analysis of sputter deposited ZrN coating by CFD

The objective of the present work is to investigate the effect of various sputtering parameters such as velocity, mass flow rate on velocity profiles, pressure profiles, density profiles and concentration distribution of the process gases (argon and nitrogen) of zirconium nitride films deposited on glass and silica substrate by RF magnetron sputtering. A three dimensional Computational Fluid Dynamics (CFD) study has been carried out using Fluent-ANSYS commercial code to visualize the mixing behavior of process gases inside the deposition chamber. The results show that the location of gas inlet port has a greater influence on gas distribution inside the chamber where reactive gas will form coating. By having this information, one can able to modify the reactor geometry and gas flow openings along with its positions for better gas flow over the substrate which in turns gives an indirect indication of coating from the composition point of view.

Effect of gas ratio on tribological properties of sputter deposited TiN coatings

Titanium nitride (TiN) coatings were deposited on Si, corning glass, pins of mild steel (MS, ϕ3mm), aluminium (Al, ϕ4mm) and brass (ϕ6mm) substratesby DC magnetron sputtering. The argon and nitrogen (Ar:N2)gas ratio was precisely controlled by Mass Flow Controller (MFC) and was varied systematically at diffract values of 10:10,12:08, 16:04 and 18:02sccm. The structural properties of TiN coatings were characterized by X-ray diffraction (XRD) and its surface topography was studied using field emission scanning electron microscopy (FE-SEM). The tribological properties of TiN coatings were investigated using pin-on-disc tribometer.

Design and Fabrication of a System for Silastic Silicone Rubber O-Ring

As the industrial importance of rubber part has grown constantly during the last three decades, so have intensive experimental and theoretical investigations of the basic nature, properties and mechanical parameters of this manufacturing process. The vast advantage of knowledge based on analysis has helped the ongoing transition in the application of rubber extrusion process from an art to a science. In this paper, we explain the design and fabrication of a system comprising of extrusion die and O-ring die for silastic silicone rubber products. The initial part of the paper shows the procedure for designing extrusion die for a compressive material like rubber by analytical method. This design is further analysed using software Pro/E and ANSYS. The results of analysis have proved the stresses are in safe limits. In the 2nd part of the paper an attempt is made to fabricate an O-ring die for Silicone rubber.