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Dive into the research topics where Sushant K. Rawal is active.

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Featured researches published by Sushant K. Rawal.


Nanomaterials and Nanotechnology | 2016

Exploration of Wettability and Optical Aspects of ZnO Nano Thin Films Synthesized by Radio Frequency Magnetron Sputtering

Kartik H. Patel; Sushant K. Rawal

This paper aims to explore structural, optical and wettability aspects of zinc oxide (ZnO) nano thin films prepared by radio frequency (RF) magnetron sputtering. The deposition time is varied from 10 to 50 minutes and sputtering pressure from 0.5 to 8.0 Pa. The increase of deposition time from 10 to 50 minutes leads to formation of a single (002) peak for ZnO films; (100), (101) and (110) peaks are not observed under these conditions. The intensity for (100), (002), (101) and (110) peaks decreases with a sputtering pressure value of 3.5 Pa and above. The optical transmission and band gaps are measured by a UV-Vis-NIR spectrophotometer. The wettability and contact-angle hysteresis (CAH) for deposited ZnO nano thin films are investigated for water, ethylene glycol, sunflower oil and formamide using a contact-angle goniometer.


Archive | 2018

Study the effect of nitrogen flow rate on tribological properties of tantalum nitride based coatings

Dharmesh B. Chauhan; Kamlesh V. Chauhan; Akshay L. Sonera; Nishant S. Makwana; Divyeshkumar P. Dave; Sushant K. Rawal

Tantalum Nitride (TaN) based coatings are well-known for their high temperature stability and chemical inertness. We have studied the effect of nitrogen flow rate variation on the structural and tribological properties of TaN based coating deposited by RF magnetron sputtering process. The nitrogen flow rate was varied from 5 to 30 sccm. X-ray diffractometer (XRD) and Atomic Force Microscopy (AFM) were used to determine structure and surface topography of coating. Pin on disc tribometer was used to determine tribological properties of coating. TaN coated brass and mild steel substrates shows higher wear resistance compared to uncoated substrates of brass and mild steel.Tantalum Nitride (TaN) based coatings are well-known for their high temperature stability and chemical inertness. We have studied the effect of nitrogen flow rate variation on the structural and tribological properties of TaN based coating deposited by RF magnetron sputtering process. The nitrogen flow rate was varied from 5 to 30 sccm. X-ray diffractometer (XRD) and Atomic Force Microscopy (AFM) were used to determine structure and surface topography of coating. Pin on disc tribometer was used to determine tribological properties of coating. TaN coated brass and mild steel substrates shows higher wear resistance compared to uncoated substrates of brass and mild steel.


Integrated Ferroelectrics | 2017

Examination of various characteristics for sputtered tantalum oxide-nitride thin films deposited at various oxygen flowrates

Akash A. Gandhi; Kamlesh V. Chauhan; Jaydeep M. Kapopara; Nayan N. Jariwala; Sushant K. Rawal

ABSTRACT Tantalum oxynitride thin films were prepared by reactive sputtering. The argon and nitrogen flow rate were kept stable whereas oxygen flow rate was incremented periodically. The effect of oxygen flow rate on various properties of tantalum oxynitride thin films is reported in this research paper. XRD patterns of tantalum oxynitride thin films displayed peaks commonly as for nano-crystalline materials. Surface topography observed to be smooth and exhibited smaller grain structure. Wettability test showed promising results for hydrophobicity. Wear test was done on uncoated and coated tantalum oxynitride thin films on 10 mm diameter cylindrical pins of brass and mild steel.


INTERNATIONAL CONFERENCE ON CONDENSED MATTER AND APPLIED PHYSICS (ICC 2015): Proceeding of International Conference on Condensed Matter and Applied Physics | 2016

Effect of gas ratio on tribological properties of sputter deposited TiN coatings

Mahesh R. Chavda; Kamlesh V. Chauhan; Sushant K. Rawal

Titanium nitride (TiN) coatings were deposited on Si, corning glass, pins of mild steel (MS, ϕ3mm), aluminium (Al, ϕ4mm) and brass (ϕ6mm) substratesby DC magnetron sputtering. The argon and nitrogen (Ar:N2)gas ratio was precisely controlled by Mass Flow Controller (MFC) and was varied systematically at diffract values of 10:10,12:08, 16:04 and 18:02sccm. The structural properties of TiN coatings were characterized by X-ray diffraction (XRD) and its surface topography was studied using field emission scanning electron microscopy (FE-SEM). The tribological properties of TiN coatings were investigated using pin-on-disc tribometer.


Procedia Technology | 2014

A Review Paper on Tribological and Mechanical Properties of Ternary Nitride based Coatings

Kamlesh V. Chauhan; Sushant K. Rawal


Materials Today: Proceedings | 2016

Review on electrochromic property for WO3 thin films using different deposition techniques

Vyomesh R. Buch; Amit Kumar Chawla; Sushant K. Rawal


Procedia Technology | 2016

Examination of Zinc Oxide Films Prepared by Magnetron Sputtering

Pranav Y. Dave; Kartik H. Patel; Kamlesh V. Chauhan; Amit Kumar Chawla; Sushant K. Rawal


Procedia Technology | 2016

Tribological Characterization of TiN Coatings Prepared by Sputtering

Mahesh R. Chavda; Divyesh P. Dave; Kamlesh V. Chauhan; Sushant K. Rawal


Procedia Technology | 2016

Investigation of Various Properties for Zirconium Oxide Films Synthesized by Sputtering

Uttkarsh S. Patel; Kartik H. Patel; Kamlesh V. Chauhan; Amit Kumar Chawla; Sushant K. Rawal


Procedia Technology | 2016

Study of Tribological Behavior for Chromium Based Coatings Deposited on Conventional Materials

Divyesh P. Dave; Kamlesh V. Chauhan; Mahesh R. Chavda; Sushant K. Rawal

Collaboration


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Kamlesh V. Chauhan

Charotar University of Science and Technology

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Kartik H. Patel

Charotar University of Science and Technology

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Amit Kumar Chawla

University of Petroleum and Energy Studies

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Divyesh P. Dave

Charotar University of Science and Technology

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Divyeshkumar P. Dave

Sardar Patel College of Engineering

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Jaydeep M. Kapopara

Charotar University of Science and Technology

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Nayan N. Jariwala

Charotar University of Science and Technology

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Pranav Y. Dave

Charotar University of Science and Technology

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Ramesh Chandra

Indian Institute of Technology Roorkee

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Uttkarsh S. Patel

Charotar University of Science and Technology

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