Karl Heinz Dr. Neisius

Agent and method for the removal of photoresist and stripper residues from semiconductor substrates

Photoresists suitable for forming relief structures of highly heat-resistant polymers

Method for stripping photolacquers

Negatively operating photoresist composition, with radiation-absorbing additives

Negative photoresist formulations with radiation-absorbing additives

Light-sensitive compounds for positive photoresist materials

MITTEL UND VERFAHREN ZUR ENTFERNUNG VON FOTORESIST- UND STRIPPERRESTEN VON HALBLEITERSUBSTRATEN

Photoresist for creating relief structures on high-temperature resistant polymers

Mittel und verfahren zur entfernung von fotoresist- und stripperresten von halbleitersubstraten Means and methods for removal of photoresist and stripper residues from semiconductor substrates

Bisarido compounds, light-sensitive compositions containing them and process for obtaining relief images.