Rudolf Klug

Photoresists suitable for forming relief structures of highly heat-resistant polymers

Polyamide ester photoresist formulations of enhanced sensitivity

Stabilized solutions of radiation-crosslinkable polymer precursors of highly heat-resistant polymers

Process for the development of relief structures based on radiation-crosslinked polymeric precursors of polymers which are resistant to high temperature

Process for the development of polymeric high temperature-resistant relief structures obtained by the cross-radiation cross-linking of prepolymers

Photoresist compositions with enhanced sensitivity using polyamide esters

Photoresist for creating relief structures on high-temperature resistant polymers

Liquid crystal OMI-type display device

Negativ-fotoresists von polyimid-typ mit 1,2-disulfonen Disulfones 1,2-negative photo resists of polyimide-type with

Negative photoresists of the polyimide type with 1,2-disulfones