Kathie L. Lusker

Engineering the spatial selectivity of surfaces at the nanoscale using particle lithography combined with vapor deposition of organosilanes

Particle lithography is a practical approach to generate millions of organosilane nanostructures on various surfaces, without the need for vacuum environments or expensive instrumentation. This report describes a stepwise chemistry route to prepare organosilane nanostructures and then apply the patterns as a spatially selective foundation to attach gold nanoparticles. Sites with thiol terminal groups were sufficiently small to localize the attachment of clusters of 2-5 nanoparticles. Basic steps such as centrifuging, drying, heating, and rinsing were used to generate arrays of regular nanopatterns. Close-packed films of monodisperse latex spheres can be used as an evaporative mask to spatially direct the placement of nanoscopic amounts of water on surfaces. Vapor phase organosilanes deposit selectively at areas of the surface containing water residues to generate nanostructures with regular thickness, geometry, and periodicity as revealed in atomic force microscopy images. The area of contact underneath the mesospheres is effectively masked for later synthetic steps, providing exquisite control of surface coverage and local chemistry. By judicious selection in designing the terminal groups of organosilanes, surface sites can be engineered at the nanoscale for building more complex structures. The density of the nanopatterns and surface coverage scale predictably with the diameter of the mesoparticle masks. The examples presented definitively illustrate the capabilities of using the chemistry of molecularly thin films of organosilanes to spatially define the selectivity of surfaces at very small size scales.

Self-assembly of octadecyltrichlorosilane: Surface structures formed using different protocols of particle lithography

Summary Particle lithography offers generic capabilities for the high-throughput fabrication of nanopatterns from organosilane self-assembled monolayers, which offers the opportunity to study surface-based chemical reactions at the molecular level. Nanopatterns of octadecyltrichlorosilane (OTS) were prepared on surfaces of Si(111) using designed protocols of particle lithography combined with either vapor deposition, immersion, or contact printing. Changing the physical approaches for applying molecules to masked surfaces produced OTS nanostructures with different shapes and heights. Ring nanostructures, nanodots and uncovered pores of OTS were prepared using three protocols, with OTS surface coverage ranging from 10% to 85%. Thickness measurements from AFM cursor profiles were used to evaluate the orientation and density of the OTS nanostructures. Differences in the thickness and morphology of the OTS nanostructures are disclosed based on atomic force microscopy (AFM) images. Images of OTS nanostructures prepared on Si(111) that were generated by the different approaches provide insight into the self-assembly mechanism of OTS, and particularly into the role of water and solvents in hydrolysis and silanation.

Nanostructures of Functionalized Gold Nanoparticles Prepared by Particle Lithography with Organosilanes

Periodic arrays of organosilane nanostructures were prepared with particle lithography to define sites for selective adsorption of functionalized gold nanoparticles. Essentially, the approach for nanoparticle lithography consists of procedures with two masks. First, latex mesospheres were used as a surface mask for deposition of an organosilane vapor, to produce an array of holes within a covalently bonded, organic thin film. The latex particles were readily removed with solvent rinses to expose discrete patterns of nanosized holes of uncovered substrate. The nanostructured film of organosilanes was then used as a surface mask for a second patterning step, with immersion in a solution of functionalized nanoparticles. Patterned substrates were fully submerged in a solution of surface-active gold nanoparticles coated with 3-mercaptopropyltrimethoxysilane. Regularly shaped, nanoscopic areas of bare substrate produced by removal of the latex mask provided sites to bind silanol-terminated gold nanoparticles, and the methyl-terminated areas of the organosilane film served as an effective resist, preventing nonspecific adsorption on masked areas. Characterizations with atomic force microscopy demonstrate the steps for lithography with organosilanes and functionalized nanoparticles. Patterning was accomplished for both silicon and glass substrates, to generate nanostructures with periodicities of 200-300 nm that match the diameters of the latex mesospheres of the surface masks. Nanoparticles were shown to bind selectively to uncovered, exposed areas of the substrate and did not attach to the methyl-terminal groups of the organosilane mask. Billions of well-defined nanostructures of nanoparticles can be generated using this high-throughput approach of particle lithography, with exquisite control of surface density and periodicity at the nanoscale.

Achieving precision and reproducibility for writing patterns of n-alkanethiol self-assembled monolayers with automated nanografting

Nanografting is a high-precision approach for scanning probe lithography, which provides unique advantages and capabilities for rapidly writing arrays of nanopatterns of thiol self-assembled monolayers (SAMs). Nanografting is accomplished by force- induced displacement of molecules of a matrix SAM, followed immediately by the self-assembly of n-alkanethiol ink molecules from solution. The feedback loop used to control the atomic force microscope tip position and displacement enables exquisite control of forces applied to the surface, ranging from pico to nanonewtons. To achieve high-resolution writing at the nanoscale, the writing speed, direction, and applied force need to be optimized. There are strategies for programing the tip translation, which will improve the uniformity, alignment, and geometries of nanopatterns written using open-loop feedback control. This article addresses the mechanics of automated nanografting and demonstrates results for various writing strategies when nanografting patterns of n-alkanethiol SAMs.