Kazunori Imaoka

Method of producing semiconductor-on-insulator structure by besol process with charged insulating layers

Semiconductor device having trench isolation.

Method of fabricating semiconductor devices using an intermediate grinding step

Semiconductor device having a SOI substrate and fabrication method thereof

Process for forming planar wiring using polysilicon to fill gaps

Methods of forming denuded zone in wafer by intrinsic gettering and forming bipolar transistor therein

Semiconductor device having silicon-on-insulator structure

A METHOD FOR THE PRODUCTION OF A SEMICONDUCTOR DEVICE COMPRISING ANNEALING A SILICON WAFER

Method of fabricating a metal-oxide-semiconductor device having a semiconductor on insulator (SOI) structure

Process for producing a semiconductor device with a bulk-defect region having a nonuniform depth