Kazuo Mera
Hitachi
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Publication
Featured researches published by Kazuo Mera.
Review of Scientific Instruments | 2000
Katsumi Tokiguchi; Takayoshi Seki; Junya Ito; Toshihiko Sato; Kazuo Mera
A high-current microwave ion source which is used for O+ ion implantation in separation by implanted oxygen (SIMOX) wafer fabrication is presented. The source consists of a new transform waveguide which efficiently propagates a 2.45 GHz microwave power into the ion source, a cylindrical plasma chamber of 90 mm in diameter, and a multiaperture extraction electrode system. The extracted beams are mass separated and then postaccelerated up to 200 keV. Ion source operates stably for a long time and the microwave absorption efficiency is as high as 80%. A total extraction current of 240 mA is obtained at the extraction voltage of 50–60 kV and the mass-separated O+ current reaches about 100 mA at the same extraction voltage. The data show that the ion source has a good potential to provide 100 mA-class O+ ion beams stably in the wide energy range demanded for SIMOX ion implantation.
Archive | 1996
Kazuo Mera; Isao Hashimoto; Yasuo Yamashita; Minoru Fujimoto; Kouji Ishiguro
Archive | 1997
Katsumi Tokiguchi; Takayoshi Seki; Kensuke Amemiya; Yasuo Yamashita; Kazuo Mera; Isao Hashimoto; Keiji Arimatsu
Archive | 1991
Tateoki Miyauchi; Shigenobu Maruyama; Katsurou Mizukoshi; Mikio Hongo; Koyo Morita; Kaoru Katayama; Minoru Suzuki; Kazuo Mera; Haruhisa Sakamoto
Archive | 1991
Kiyoshi Okumura; Kazuhiko Nishimura; Minoru Fujimoto; Hiroo Ohkawa; Kazuo Mera; Shigeo Shiono
Archive | 2003
Kazuo Mera; Kenichi Natsui; Hiroyuki Tomita; Kazunori Tsufuku; 博之 冨田; 健一 夏井; 和典 津布久; 和夫 米良
Archive | 1989
Minoru Suzuki; Kazuo Mera
Archive | 1997
Isao Hashimoto; Kazuo Mera
Archive | 2002
Hiroyuki Tomita; Kazuo Mera
Archive | 2000
Seiji Takayama; Takayuki Yano; Satoshi Suzuki; Kazuo Mera; Hiroyuki Tomita
