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Dive into the research topics where Kazuyuki Oguri is active.

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Featured researches published by Kazuyuki Oguri.


Surface & Coatings Technology | 1991

Tribological properties and characterization of diamond-like carbon coatings with silicon prepared by plasma-assisted chemical vapour deposition

Kazuyuki Oguri; Tohru Arai

Abstract Amorphous C-Si coatings containing hydrogen (a-C-Si-H) were formed by a d.c. glow discharge method from reactant gases of CH4, SiCl4, H2, and argon. Coatings with a smooth surface, a hardness of HV 2000 and adhesion to steel substrates were obtained below 550 °C at a deposition rate of 1–4 μm h-1. The ball-on-disk test, against steel with no lubricant in ambient atmosphere, revealed that the friction coefficient μ of the a-C-Si-H coatings changed markedly with the carbon content. μ abruptly decreased from 0.43 to 0.16 at around 60 at.% C (composition excluding hydrogen) and reached a minimum value as low as 0.04 in a range of about 75–85 at.% C content. Laser Raman spectroscopy indicated that the low-friction a-C-Si-H coatings consisted of diamond-like carbon with silicon (DLC-Si). The μ value of 0.04 was below one-third that of DLC coatings without silicon, where μ = 0.12–0.20. The wear of both the DLC-Si and the counter steel ball was very small.


Thin Solid Films | 1991

Effect of N2-to-TiCl4 flow rate ratio on the properties of TiN coatings formed by d.c. discharge plasma-assisted chemical vapor deposition

Kazuyuki Oguri; Hironori Fujita; Tohru Arai

Abstract Attempts have been made to clarify the effect of the N 2 -to-TiCl 4 flow rate ratio on properties of TiN coatings which were formed on M2 steel and pure iron at a temperature of 550 by a d.c. glow discharge method from mixed gases of TiCl 4 , N 2 , H 2 and argon. The deposition rate of the coatings saturated at an N 2 -to-TiCl 4 flow rate ratio of 8 to 9. The composition and hardness of the coatings remained unchanged with the N 2 -to-TiCl 4 flow rate ratio except for the maximum ratio of 14.3, whereas the preferred orientation and microstructure changed markedly from (111) to (200), and from columnar to non-oriented. The coatings deposited at an N 2 -to-TiCl 4 flow rate ratio of 3 to 6, which resulted in the (200) preferred orientation and fine grained dense structure, showed greater adhesion strength.


Thin Solid Films | 1990

Effect of excess carbon on the hardness of SiC and TiC coatings formed by plasma-assisted chemical vapor deposition

Kazuyuki Oguri; Tohru Arai

On etudie egalement les etats de liaison des atomes de carbone en exces dans leurs revetements, par spectroscopie Raman


Thin Solid Films | 1988

Plasma-assisted chemical vapour deposition of TiN and TiC on steel: Properties of coatings

Tohru Arai; Hironori Fujita; Kazuyuki Oguri


Archive | 1990

HARD AND LUBRICANT THIN FILM OF IRON BASE METALLIC MATERIAL COATED WITH AMORPHOUS CARBON-HYDROGEN-SILICON

Tohru Arai; Kazuyuki Oguri


Thin Solid Films | 1992

Friction coefficient of SiC, TiC and GeC coatings with excess carbon formed by plasma-assisted chemical vapour deposition

Kazuyuki Oguri; Tohru Arai


Archive | 1990

Hard and lubricant thin film of amorphous carbon-hydrogen-silicon, iron base metallic material coated therewith, and the process for producing the same

Tohru Arai; Kazuyuki Oguri


Archive | 1992

Amorphous thin film as solid lubricant on a substrate and method for production thereof

Tatsumi Hioki; Kazuyuki Oguri


Archive | 1989

Process for ion nitriding aluminum material

Hideo Tachikawa; Tohru Arai; Hironori Fujita; Kazuyuki Oguri


Archive | 1991

Amorphous thin film having solid lubricity and its production thereof

Tatsumi Hioki; Kazuyuki Oguri; 和幸 小栗; 辰視 日置

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Masahiro Kashiwagi

Mitsubishi Heavy Industries

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Takeyasu Tarumi

Mitsubishi Heavy Industries

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Yuichiro Kamino

Mitsubishi Heavy Industries

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