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Dive into the research topics where Keiichi Yamazaki is active.

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Featured researches published by Keiichi Yamazaki.


Materials Letters | 1994

A new type of nanocomposite in tetragonal zirconia polycrystal-molybdenum system

Masahiro Nawa; Keiichi Yamazaki; Tohru Sekino; Koichi Niihara

Abstract A ceramic/metal nanocomposite in tetragonal zirconia-molybdenum system possesses a novel microstructural feature composed of a mutual intragranular nanostructure, in which either nanometer sized Mo particles or equivalent sized zirconia particles are located within the zirconia grains or Mo grains, respectively. It achieves a simultaneous improvement in strength and toughness that overcomes the strength-toughness tradeoff relation.


Journal of microelectronics and electronic packaging | 2005

Pretreatment of blind via holes before ni/au and cu plating applied with atmospheric pressure plasma jet

Yasushi Sawada; Keiichi Yamazaki; Noriyuki Taguchi; Tetsuji Shibata

The effectiveness of atmospheric pressure (AP) plasma preprocessing before Ni/Au or Cu plating has been examined by applying it to a build-up printed circuit board (FR-4 grade) and polyimide-based flexible circuit film, both with blind via-holes (BVHs). The AP plasma applied with a dielectric barrier discharge is generated inside a 56 mm wide quartz vessel by an RF power generator using Ar-O2 gas mixture. One side of the vessel is open and the plasma jet is blown on the sample substrate transported 5 mm downward from the outlet of the vessel. The deposit failure rate of Ni/Au electroless deposit to 50 μm-diameter BVHs formed on a photo resist on the printed circuit board is 12.5% without preprocessing but is decreased to 0% after applying the AP plasma processing. As for 50 μm-diameter BVHs formed with a YAG laser on a polyimide-based flexible circuit film, the bump formation using electrolytic copper plating fails without preprocessing, but a 100% bump formation rate is achieved after applying AP plasma ...


Archive | 2006

Plasma treatment apparatus and plasma treatment method

Keiichi Yamazaki; Yukiko Inooka; Yasushi Sawada; Noriyuki Taguchi; Yoshiyuki Nakazono; Akio Nakano


Archive | 2000

Plasma treatment apparatus and plasma generation method using the apparatus

Noriyuki Taguchi; Yasushi Sawada; Keiichi Yamazaki; Yoshiyuki Nakazono; Yukiko Inooka; Kazuaya Matsushita Electric Works Ltd. Kitayama


Archive | 2004

Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method

Tetsuji Shibata; Keiichi Yamazaki; Noriyuki Taguchi; Yasushi Sawada


Archive | 1995

Zirconia based composite material and method of manufacturing the same product

Keiichi Yamazaki; Masahiro Nawa; Koichi Niihara; Atsushi Nakahira; Tohru Sekino


Archive | 1998

Plasma treating system and method thereof

Yoshimi Inoue; Masuhiro Kokoma; Sachiko Okazaki; Koji Sawada; Keiichi Yamazaki; 吉民 井上; 益弘 小駒; 圭一 山崎; 幸子 岡崎; 康志 澤田


Archive | 1996

THERMOELECTRIC CONVERSION MATERIAL AND ITS MANUFACTURE

Shoichi Nakamoto; Masahiro Nawa; Keiichi Yamazaki; 彰一 中本; 正弘 名和; 圭一 山崎


Archive | 2010

Wavelength conversion particle, wavelength conversion member using same, and light emitting device

Shinji Shibamoto; Keiichi Yamazaki; Shunpei Fujii; Tomokazu Kusunoki


Archive | 2000

PLASMA TREATMENT DEVICE AND PLASMA LIGHTING METHOD

Yukiko Inooka; Yoshiyuki Nakazono; Koji Sawada; Noriyuki Taguchi; Keiichi Yamazaki; 佳幸 中園; 圭一 山崎; 康志 澤田; 結希子 猪岡; 典幸 田口

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Koichi Niihara

Nagaoka University of Technology

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Atsushi Nakahira

Osaka Prefecture University

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