Is this you? Create Your Porfile
Avatar

Keizou Hirai

Hitachi

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Keizou Hirai is active.

Explore More

Publication

Featured researches published by Keizou Hirai.

Archive | 2000

Method for producing cerium oxide, cerium oxide abrasive, method for polishing substrate using the same and method for manufacturing semiconductor device

Jun Matsuzawa; Atsushi Sugimoto; Masato Yoshida; Keizou Hirai; Toranosuke Ashizawa; Yuuto Ootsuki

Archive | 2000

Abrasive compound for cmp, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for cmp abrasive compound

Naoyuki Koyama; Kouji Haga; Masato Yoshida; Keizou Hirai; Toranosuke Ashizawa; Youiti Machii

Archive | 2009

CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive

Naoyuki Koyama; Kouji Haga; Masato Yoshida; Keizou Hirai; Toranosuke Ashizawa; Youiti Machii

Archive | 2000

Cerium oxide abrasive, method for polishing substrate using the same and method for manufacturing semiconductor device

Jun Matsuzawa; Atsushi Sugimoto; Masato Yoshida; Keizou Hirai; Toranosuke Ashizawa; Yuuto Ootsuki

Archive | 2000

USE OF CMP ABRASIVE

Naoyuki Koyama; Kouji Haga; Masato Yoshida; Keizou Hirai; Toranosuke Ashizawa; Youiti Machii

Archive | 2000

Verwendung eines cmp schleifmittels

Naoyuki Koyama; Kouji Haga; Masato Yoshida; Keizou Hirai; Toranosuke Ashizawa; Youiti Machii

Archive | 2000

Verwendung eines cmp schleifmittels Using a cmp grinding means

Toranosuke Ashizawa; Kouji Hitachi-shi Haga; Keizou Hirai; Naoyuki Koyama; Youiti Machii; Masato Hitachi Kasei Matsushiro Haus Yoshida

Archive | 2000

Verwendung eines cmp schleifmittels Using a grinding means cmp

Naoyuki Koyama; Kouji Haga; Masato Yoshida; Keizou Hirai; Toranosuke Ashizawa; Youiti Machii

Archive | 2000

Method for producing cerium oxide

Jun Matsuzawa; Atsushi Sugimoto; Masato Yoshida; Keizou Hirai; Toranosuke Ashizawa; Yuuto Ootsuki

Archive | 2000

Method for polishing a substrate using CMP abrasive

Naoyuki Koyama; Kouji Haga; Masato Yoshida; Keizou Hirai; Toranosuke Ashizawa; Youiti Machii

Explore More

Collaboration

Dive into the Keizou Hirai's collaboration.

Top Co-Authors
Avatar

Toranosuke Ashizawa

Hitachi

View shared research outputs
Top Co-Authors
Avatar

Masato Yoshida

Hitachi

View shared research outputs
Top Co-Authors
Avatar

Youiti Machii

Hitachi

View shared research outputs
Top Co-Authors
Avatar

Kouji Haga

Hitachi

View shared research outputs
Top Co-Authors
Avatar

Atsushi Sugimoto

Hitachi

View shared research outputs
Top Co-Authors
Avatar

Jun Matsuzawa

Hitachi

View shared research outputs
Top Co-Authors
Avatar

Naoyuki Koyama

Hitachi

View shared research outputs
Top Co-Authors
Avatar

Yuuto Ootsuki

Hitachi

View shared research outputs
Top Co-Authors
Avatar

Naoyuki Koyama

Hitachi

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge