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Kouji Haga

Hitachi

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Publication

Featured researches published by Kouji Haga.

Archive | 2004

Cmp polishing compound and polishing method

Masato Fukasawa; Masato Yoshida; Naoyuki Koyama; Yuto Ootsuki; Chiaki Yamagishi; Kazuhiro Enomoto; Kouji Haga; Yasushi Kurata

Archive | 2005

CMP polishing slurry and method of polishing substrate

Masato Fukasawa; Naoyuki Koyama; Kouji Haga; Toshiaki Akutsu

Archive | 2000

Abrasive compound for cmp, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for cmp abrasive compound

Naoyuki Koyama; Kouji Haga; Masato Yoshida; Keizou Hirai; Toranosuke Ashizawa; Youiti Machii

Archive | 2007

Polishing slurry for chemical mechanical polishing and method for polishing substrate

Kouji Haga; Yuto Ootsuki; Yasushi Kurata; Kazuhiro Enomoto

Archive | 2009

CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive

Naoyuki Koyama; Kouji Haga; Masato Yoshida; Keizou Hirai; Toranosuke Ashizawa; Youiti Machii

Archive | 2008

Polishing liquid for metal film and polishing method

Kouji Haga; Masato Fukasawa; Jin Amanokura; Hiroshi Nakagawa

Archive | 2000

USE OF CMP ABRASIVE

Naoyuki Koyama; Kouji Haga; Masato Yoshida; Keizou Hirai; Toranosuke Ashizawa; Youiti Machii

Archive | 2009

POLISHING SOLUTION FOR METAL FILMS AND POLISHING METHOD USING THE SAME

Kouji Haga; Masato Fukasawa; Hiroshi Nakagawa; Kouji Mishima

Archive | 2003

Cmp abrasive and substrate polishing method

Kouji Haga; Yuto Ootsuki; Yasushi Kurata; Kazuhiro Enomoto

Archive | 2008

Metal film polishing liquid and polishing method

Kouji Haga; Masato Fukasawa; Jin Amanokura; Hiroshi Nakagawa

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Collaboration

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Masato Fukasawa

Hitachi

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Masato Yoshida

Hitachi

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Naoyuki Koyama

Hitachi

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Keizou Hirai

Hitachi

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Toranosuke Ashizawa

Hitachi

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Youiti Machii

Hitachi

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Hiroshi Nakagawa

Hitachi

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Jin Amanokura

Hitachi

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Kazuhiro Enomoto

Hitachi

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Kouji Mishima

Hitachi

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