Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Kenji Furuta is active.

Publication


Featured researches published by Kenji Furuta.


electronic components and technology conference | 2016

A Novel Dicing Technologies for WLCSP Using Stealth Dicing through Dicing Tape and Back Side Protection-Film

Shinya Takyu; Yusuke Fumita; Daisuke Yamamoto; Shigeyuki Yamashita; Kenji Furuta; Yohei Yamashita; Kei Tanaka; Naoki Uchiyama; Takafumi Ogiwara; Yuta Kondo

Market demand of IC package for communication is increasing along with the popularization of mobile type of information and communication devices. Wafer Level Chip Scale Package (WLCSP) is popular method for above mentioned devices from production cost point of view and is widely used for this kind of mobile devices. There are two requirements for the WLCSP nowadays. One is a cost reduction, the other is a solution to package crack. The main idea of a cost reduction is a dicing street reduction. The dicing street reduction leads to the increasing the number of die per wafer (die gross) that means a reduction of production cost. We select a Stealth dicing process. SD process is expected to increase the number of die that can be obtained from a wafer compared to normal dicing because it is possible to make the necessary street width (cut width) narrower. Almost WLCSPs are typically mounted on board with only solder joint, without under fill and so solder joint reliability is a prime concern. Especially side walls of WLCSP are not covered with protection material like under fill, so mechanical damage on side walls caused by dicing process leads to package crack at Thermal Cycle Test (TCT). This side wall damage and cracks are serious problem recently. SD process might avoid this side wall crack also. In this paper, we propose a novel dicing technologies for WLCSP using stealth dicing through dicing tape and back side protection-film that can make the necessary street width (cut width) narrower that means street reduction and avoid the package crack of TCT and the drop test.


Archive | 2011

PROCESSING METHOD OF SAPPHIRE SUBSTRATE

Kenji Furuta; Hitoshi Hoshino; Hiroshi Morikazu; Yukio Morishige; Tatsugo Oba; Koji Yamaguchi; 健次 古田; 龍吾 大庭; 浩司 山口; 仁 星野; 洋司 森敷; 幸雄 森重


Archive | 2007

Method of processing sapphire substrate

Hitoshi Hoshino; Koji Yamaguchi; Kenji Furuta; Hiroshi Morikazu; Ryugo Oba; Yukio Morishige


Archive | 2011

SINGLE CRYSTAL SUBSTRATE WITH MULTILAYER FILM, MANUFACTURING METHOD FOR SINGLE CRYSTAL SUBSTRATE WITH MULTILAYER FILM, AND ELEMENT MANUFACTURING METHOD

Hideo Aida; Natsuko Aota; Hitoshi Hoshino; Kenji Furuta; Tomosaburo Hamamoto; Keiji Honjo


Archive | 2011

Single crystal substrate, manufacturing method for single crystal substrate, manufacturing method for single crystal substrate with multilayer film, and element manufacturing method

Hideo Aida; Natsuko Aota; Hitoshi Hoshino; Kenji Furuta; Tomosaburo Hamamoto; Keiji Honjo


Archive | 2011

Crystalline film, device, and production methods for crystalline film and device

Hideo Aida; Natsuko Aota; Hitoshi Hoshino; Kenji Furuta; Tomosaburo Hamamoto; Keiji Honjo


Archive | 2011

Crystalline film, device, and manufacturing methods for crystalline film and device

Hideo Aida; Natsuko Aota; Hitoshi Hoshino; Kenji Furuta; Tomosaburo Hamamoto; Keiji Honjo


Archive | 2011

INTERNALLY REFORMED SUBSTRATE FOR EPITAXIAL GROWTH, INTERNALLY REFORMED SUBSTRATE WITH MULTILAYER FILM, SEMICONDUCTOR DEVICE, BULK SEMICONDUCTOR SUBSTRATE, AND MANUFACTURING METHODS THEREFOR

Hideo Aida; Natsuko Aota; Hitoshi Hoshino; Kenji Furuta; Tomosaburo Hamamoto; Keiji Honjo


Archive | 2011

Internal reforming substrate for epitaxial growth, internal reforming substrate with multilayer film, semiconductor device, bulk semiconductor substrate, and production methods therefor

Hideo Aida; Natsuko Aota; Hitoshi Hoshino; Kenji Furuta; Tomosaburo Hamamoto; Keiji Honjo


Archive | 2011

Single crystal substrate with multilayer film, production method for single crystal substrate with multilayer film, and device production method

Hideo Aida; Natsuko Aota; Hitoshi Hoshino; Kenji Furuta; Tomosaburo Hamamoto; Keiji Honjo

Collaboration


Dive into the Kenji Furuta's collaboration.

Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Researchain Logo
Decentralizing Knowledge