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Dive into the research topics where Kentaro Nishikata is active.

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Featured researches published by Kentaro Nishikata.


Chemical Communications | 2009

SERRS fiber probe: fabrication of silver nanoparticles at the aperture of an optical fiber used for SNOM

Yasutaka Kitahama; Tamitake Itoh; Junichi Aoyama; Kentaro Nishikata; Yukihiro Ozaki

At the aperture of an optical fiber coupled with a SNOM SERRS-active Ag nanoparticles were selectively fabricated in a mixture of AgNO(3) and sodium citrate aqueous solution by photo-reduction due to an evanescent field.


international conference on micro electro mechanical systems | 2012

Cathodoluminescence spectroscopy study for non-destructive stress analysis of thermal silicon-oxide film

Nobutaka Goami; Takahiro Namazu; N. Yamashita; Satoshi Ichikawa; Nobuyuki Naka; Shigeru Kakinuma; Kentaro Nishikata; Keisuke Yoshiki; Shozo Inoue

In this article, a technique for non-destructive stress analysis of thermal silicon-oxide (SiOx) film using cathodoluminescence (CL) spectroscopy is described. The uniaxial tensile tester which can be used in a scanning electron microscope (SEM) chamber was developed to apply tensile stress to the film specimen. CL spectra of SiOx film were measured under various tensile stresses. The peak position linearly increased at 7.53×10-3 eV/GPa with an increase in tensile stress. The peak intensity and half bandwidth changed with an increase in electron beam (EB) irradiation time period. Using Raman spectroscope and transmission electron microscope (TEM), it was found that EB irradiation produced silicon nanocrystals in SiOx film. The nanocrystals as well as applied stress affected CL spectra.


Archive | 2006

Sample measuring device

Kentaro Nishikata; Yutaka Saijo; Shigeru Kakinuma; Junichi Aoyama; Satoshi Ohashi


Archive | 2012

X-RAY ANALYSIS DEVICE

Kentaro Nishikata; Satoshi Ohashi; Takashi Komatsubara


Journal of Nanoscience and Nanotechnology | 2011

In-situ cathodoluminescence spectroscopy of silicon oxide thin film under uniaxial tensile loading.

Takahiro Namazu; Naoaki Yamashita; Shigeru Kakinuma; Kentaro Nishikata; Nobuyuki Naka; Koichi Matsumoto; Shozo Inoue


Archive | 2007

Sample-measuring instrument

Junichi Aoyama; Shigeru Kakinuma; Kentaro Nishikata; Yutaka Saijo; 繁 柿沼; 健太郎 西方; 豊 西條; 淳一 青山


Microscopy and Microanalysis | 2006

Local Stress Assessment in Patterned Interlayer Dielectric Films using Cathodoluminescence Spectroscopy

Shigeru Kakinuma; M Kodera; Kentaro Nishikata; Junichi Aoyama; Yutaka Saijo; G Pezzotti


The Proceedings of the Materials and Mechanics Conference | 2012

OS1908 Stress Measurement for Silicon Oxide Film using Cathodoluminescence Spectroscopy : Investigation of electron irradiation damage

Nobutaka Goami; Takahiro Namazu; Naoaki Yamashita; Satoshi Ichikawa; Nobuyuki Naka; Shigeru Kakinuma; Kentaro Nishikata; Keisuke Yoshiki; Shozo Inoue


The Japan Society of Applied Physics | 2009

Uniaxial Tensile Testing System for Quantitative Stress Analysis in Silicon Oxide Thin Films by Cathodoluminescence Spectroscopy

Nobutaka Goami; Naoaki Yamashita; Nozomu Araki; Shigeru Kakinuma; Kentaro Nishikata; Nobuyuki Naka; K. Matsumoto; Takahiro Namazu; Shozo Inoue


The Japan Society of Applied Physics | 2008

Direct Observation of Tensile Stress in Silicon Oxide Films using Cathodoluminescence Spectroscopy

Shigeru Kakinuma; Kentaro Nishikata; Naoaki Yamashita; Nobuyuki Naka; Shinsuke Kashiwagi; K. Matsumoto; Takahiro Namazu; Shozo Inoue

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Takahiro Namazu

Aichi Institute of Technology

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