Kevin W. Warren
IBM
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Publication
Featured researches published by Kevin W. Warren.
Ibm Journal of Research and Development | 2003
Stephen V. Kosonocky; Azeez Bhavnagarwala; K. Chin; George D. Gristede; Anne-Marie Haen; Wei Hwang; Mark B. Ketchen; Suhwan Kim; Daniel R. Knebel; Kevin W. Warren; Victor Zyuban
As CMOS technology scales to deep-submicron dimensions, designers face new challenges in determining the proper balance between aggressive high-performance transistors and lower-performance transistors to optimize system power and performance for a given application. Determining this balance is crucial for battery-powered handheld devices in which transistor leakage and active power limit the available system performance. This paper explores these questions and describes circuit techniques for low-power communication systems which exploit the capabilities of advanced CMOS technology.
Ibm Journal of Research and Development | 1998
Evan G. Colgan; Paul Matthew Alt; Robert L. Wisnieff; Peter M. Fryer; Eileen A. Galligan; William S. Graham; Paul F. Greier; Raymond Robert Horton; Harold Ifill; Leslie Charles Jenkins; Richard A. John; Richard I. Kaufman; Yue Kuo; Alphonso P. Lanzetta; Kenneth F. Latzko; Frank R. Libsch; Shui-Chih Alan Lien; Steven Edward Millman; Robert Wayne Nywening; Robert J. Polastre; Carl G. Powell; Rick A. Rand; John J. Ritsko; Mary Beth Rothwell; John L. Staples; Kevin W. Warren; J. Wilson; Steven L. Wright
A 157-dot-per-inch, 262K-color, 10.5-in.- diagonal, 1280 × 1024 (SXGA) display has been fabricated using a six-mask process with Cu or Al-alloy thin-film gates. The combination of high resolution and gray-scale accuracy has been shown to render color images and text with paperlike legibility. The low-resistivity gate metallization and trilayer-type TFTs with a channel length of 6-8 µm were fabricated with a six-mask process which is extendible to larger, higher-resolution displays. A combination of double-sided driving and active line repair was used so that open gate lines or data lines did not result in visible line defects. A flexible drive-electronics system was developed to address the display and characterize its performance under different drive conditions.
Ibm Journal of Research and Development | 1998
Steven L. Wright; Kevin W. Warren; Paul Matthew Alt; Raymond Robert Horton; Chandrasekhar Narayan; Paul F. Greier; M. Kodate
A new method for repairing line defects during panel fabrication is described for high-resolution thin-film-transistor liquid crystal displays (TFT/LCDs). This approach uses electronic means in conjunction with physical rewiring to supply the appropriate data signal to the undriven segment of an open data line. Active line repair is simple and inexpensive, with the capacity for repairing numerous line defects. We have successfully implemented this repair approach on 10.4-in.-diagonal, 157-dpi prototype TFT/LCDs. This method is particularly suited for lower-volume, large-area, high-resolution TFT/LCDs, which are difficult to produce with high yield.
Archive | 1998
Arthur A. Bright; Stephen V. Kosonocky; Kevin W. Warren
Archive | 1998
Steven Edward Millman; Kevin W. Warren
Archive | 1999
Steven Edward Millman; Kevin W. Warren
Archive | 1996
Paul Matthew Alt; Pedro A. Chalco; Bruce K. Furman; Raymond Robert Horton; Chandrasekhar Narayan; Benal Lee Owens; Kevin W. Warren; Steven L. Wright
Archive | 2000
Sameh W. Asaad; Nicholas R. Dono; Ernest Nelson Mandese; Bengt-Olaf Schneider; Kevin W. Warren
Archive | 2000
Sameh W. Asaad; Nicholas R. Dono; Ernest Nelson Mandese; Bengt-Olaf Schneider; Kevin W. Warren
Archive | 2000
Sameh W. Asaad; Kevin W. Warren