Kiichi Hirano
Sanyo
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Publication
Featured researches published by Kiichi Hirano.
electronic imaging | 1997
Kiichi Hirano; Naoya Sotani; Isao Hasegawa; Tomoyuki Nohda; Hisashi Abe; Hiroki Hamada
Doped polysilicon (poly-Si) films with a low resistivity have been successfully obtained at a low temperature using novel processing technology, which was combined with the rapid thermal annealing (RTA) and ion-doping methods. P- doped poly-Si films with a sheet resistance of 3k(Omega) /
Archive | 1998
Kiichi Hirano; Naoaki Komiya
DAL were achieved with a process temperature 220 degrees C lower than that of the conventional process which combined the RTA and ion implantation methods. The uniformity of sheet resistance for P-doped poly-Si films prepared by the novel process was better that for the excimer laser annealing. The threshold voltage, subthreshold swing and field effect mobility for n-channel thin film transistors with a lightly doped drain structure using the novel process were 2.0V, 0.3V/dec., and 70cm2/V s, respectively.
Archive | 1996
Kiichi Hirano; Naoya Sotani; Toshifumi Yamaji; Yoshihiro Morimoto; Kiyoshi Yoneda
Archive | 2001
Kiichi Hirano; Naoya Sotani; Toshifumi Yamaji; Yoshihiro Morimoto; Kiyoshi Yoneda
Archive | 1996
Hiroki Hamada; Kiichi Hirano; Akifumi Sasaki
Archive | 1997
Hiroki Hamada; Kiichi Hirano; Nobuhiro Gouda; Hisashi Abe; Eiji Taguchi; Nobuhiko Oda; Yoshihiro Morimoto
Archive | 1995
Hiroki Hamada; Kiichi Hirano; Nobuhiro Gouda; Hisashi Abe; Eiji Taguchi; Nobuhiko Oda; Yoshihiro Morimoto
Archive | 2001
Hiroki Hamada; Kiichi Hirano; Akifumi Sasaki
Archive | 1995
Kiichi Hirano; Yoshihiro Morimoto; Naoya Sotani; Toshifumi Yamaji; Kiyoshi Yoneda; 敏文 山路; 貴一 平野; 直哉 曽谷; 佳宏 森本; 清 米田
Archive | 2010
Junko Hasegawa; Kiichi Hirano; Munetake Ishii; Atsushi Narusawa; Megumi Sano; Jun Takeuchi; Shinichiro Watanabe; めぐみ 佐野; 貴一 平野; 敦 成澤; 晋一郎 渡辺; 統丈 石井; 順 竹内; 純子 長谷川
