Kodera Masako | Researchain

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Archive | 1994

SLIP-OFF PREVENTING RING FOR POLISHING DEVICE

Okumura Katsuya; Watanabe Toru; Aoki Riichiro; Yano Hiroyuki; Kodera Masako; Shigeta Atsushi; Ishii Yu; Kimura Norio; Hirose Masayoshi; Tsujimura Manabu

Archive | 1993

Polishing method for planarizing layer on a semiconductor wafer

Kodera Masako; Yano Hiroyuki; Shigeta Atsushi; Aoki Riichirou; Yajima Hiromi; Okano Haruo

Archive | 1997

POLISHING END POINT DETERMINING METHOD AND DEVICE THEREOF

Takahashi Yoshimizu; Sakata Fumihiko; Kimura Norio; Kodera Masako; Shigeta Atsushi

Archive | 1996

Verfahren und Vorrichtung für die Reinigung von Werkstücken

Maekawa Tashiro; Hamada Satomi; Ono Koji; Shigeta Atsushi; Kodera Masako

Archive | 2004

Apparatus for cleaning a substrate having metal

Kodera Masako; Ito Kenya; Kamezawa Masayuki; Hamada Satomi; Katakabe Ichiro

Archive | 2004

SUBSTRATE CLEANING APPARATUS WITH METAL INTERCONNECTION TO MINIMIZE CORROSION DURING AND AFTER SUBSTRATE CLEANING PROCESS

Kodera Masako; Ito Kenya; Kamezawa Masayuki; Hamada Satomi; Katakabe Ichiro

Archive | 1999

SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF, POLISHING, POLISHING DEVICE AND REGENERATION OF POLISHING SURFACE OF POLISHING DEVICE

Kodera Masako; Yano Hiroyuki; Shigeta Atsushi; Yajima Hiromi; Aoki Riichiro

Archive | 1999

SEMICONDUCTOR DEVICE AND ITS MANUFACTURE, POLISHING METHOD AND POLISHING MACHINE THEREOF, AND REGENERATION METHOD OF POLISHING SURFACE OF THE POLISHING MACHINE

Kodera Masako; Yano Hiroyuki; Shigeta Atsushi; Yajima Hiromi; Aoki Riichiro

IEICE Technical Report; IEICE Tech. Rep. | 2017

Impact of Dry Process Damage on Chemical Mechanical Planarization with Cu/low-k Structure

Kodera Masako; Yano Hiroyuki; Miyashita Naoto

Archive | 2004

SEMICONDUCTOR WAFER POLISHING APPARATUS AND ITS POLISHING METHOD

Saito Harumitsu; Tsujimura Manabu; Yajima Hiromi; Hiuga Kazuaki; Kodama Shoichi; Imoto Yukio; Aoki Riichiro; Kodera Masako; Shigeta Atsushi; Mishima Shiro; Kono Yoshisuke

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