Kristine A. Bertness

High-Q GaN nanowire resonators and oscillators

We report high mechanical quality factors Q for GaN nanowire cantilevers grown by molecular beam epitaxy. Nanowires with 30–500nm diameters and 5–20μm lengths having resonance frequencies from 400kHzto2.8MHz were measured. Q near room temperature and 10−4Pa ranged from 2700 to above 60 000 with most above 10 000. Positive feedback to a piezoelectric stack caused spontaneous nanowire oscillations with Q exceeding 106. Spontaneous oscillations also occurred with direct e-beam excitation of unintentionally doped nanowires. Doped nanowires showed no oscillations, consistent with oscillation arising via direct actuation of piezoelectric GaN.

Steady-state and time-resolved photoluminescence from relaxed and strained GaN nanowires grown by catalyst-free molecular-beam epitaxy

We report steady-state and time-resolved photoluminescence (TRPL) measurements on individual GaN nanowires (6–20 μm in length, 30–940 nm in diameter) grown by a nitrogen-plasma-assisted, catalyst-free molecular-beam epitaxy on Si(111) and dispersed onto fused quartz substrates. Induced tensile strain for nanowires bonded to fused silica and compressive strain for nanowires coated with atomic-layer-deposition alumina led to redshifts and blueshifts of the dominant steady-state PL emission peak, respectively. Unperturbed nanowires exhibited spectra associated with high-quality, strain-free material. The TRPL lifetimes, which were similar for both relaxed and strained nanowires of similar size, ranged from 200 ps to over 2 ns, compared well with those of low-defect bulk GaN, and depended linearly on nanowire diameter. The diameter-dependent lifetimes yielded a room-temperature surface recombination velocity S of 9×103 cm/s for our silicon-doped GaN nanowires.

Steady-state and transient photoconductivity in c-axis GaN nanowires grown by nitrogen-plasma-assisted molecular beam epitaxy

Analysis of steady-state and transient photoconductivity measurements at room temperature performed on c-axis oriented GaN nanowires yielded estimates of free carrier concentration, drift mobility, surface band bending, and surface capture coefficient for electrons. Samples grown (unintentionally n-type) by nitrogen-plasma-assisted molecular beam epitaxy primarily from two separate growth runs were examined. The results revealed carrier concentration in the range of (3–6)×1016 cm−3 for one growth run, roughly 5×1014–1×1015 cm−3 for the second, and drift mobility in the range of 500–700 cm2/(V s) for both. Nanowires were dispersed onto insulating substrates and contacted forming single-wire, two-terminal structures with typical electrode gaps of ≈3–5 μm. When biased at 1 V bias and illuminated at 360 nm (3.6 mW/cm2) the thinner (≈100 nm diameter) nanowires with the higher background doping showed an abrupt increase in photocurrent from 5 pA (noise level) to 0.1–1 μA. Under the same conditions, thicker (151...

GaN Nanowires Grown by Molecular Beam Epitaxy

The unique properties of GaN nanowires grown by molecular beam epitaxy are reviewed. These properties include the absence of residual strain, exclusion of most extended defects, long photoluminescence lifetime, low surface recombination velocity, and high mechanical quality factor. The high purity of the nanowires grown by this method allows for controllable n-type doping. P-type doping presents more challenges but has been demonstrated in active light-emitting diode devices. The present understanding of nucleation and growth of these materials is also reviewed.

Effect of Growth Orientation and Diameter on the Elasticity of GaN Nanowires. A Combined in Situ TEM and Atomistic Modeling Investigation

We characterized the elastic properties of GaN nanowires grown along different crystallographic orientations. In situ transmission electron microscopy tensile tests were conducted using a MEMS-based nanoscale testing system. Complementary atomistic simulations were performed using density functional theory and molecular dynamics. Our work establishes that elasticity size dependence is limited to nanowires with diameters smaller than 20 nm. For larger diameters, the elastic modulus converges to the bulk values of 300 GPa for c-axis and 267 GPa for a- and m-axis.

MESFETs Made From Individual GaN Nanowires

In this paper, we demonstrate novel MESFETs based on individual GaN nanowires. The Pt/Au Schottky gates exhibited excellent two-terminal Schottky diode rectification behavior. The average effective Schottky barrier height was 0.87 eV, with an average ideality factor of 1.6. In addition, the Schottky gates efficiently modulated the conduction of the nanowires. The threshold gate voltages required for complete pinch off were as small as -2.6 V, and transconductances exceeded 1.4 muS. Subthreshold swings approaching 60 mV/decade and on/off current ratios of up to 5times108 were achieved. These results show that the Schottky gate has the potential to significantly improve the performance of GaN nanowire field-effect devices.

Optoelectronic device performance on reduced threading dislocation density GaAs/Si

A technique for the heteroepitaxy of GaAs/Si films having reduced threading dislocation density is presented. The important attribute of this technique is the suppression of three-dimensional Volmer–Weber island formation during initial deposition. This suppression is achieved by deposition of a stoichiometric GaAs buffer layer by a migration-enhanced epitaxy technique on silicon at 348 K to a thickness greater than the “monolithic thickness,” hm. Subsequent GaAs films deposited by conventional molecular beam epitaxy on buffer layers of thickness greater than hm possess structural and optical characteristics that exceed those for state-of-the-art GaAs/Si layers: an x-ray full width at half maximum (FWHM) of 110 arcsec with a dislocation density at the film surface of 3×106 cm−2 and a concomitant 4 K photoluminescence FWHM of 2.1 meV. The p-i-n structures suitable for use as light-emitting diodes (LEDs) that were grown on the reduced threading dislocation density GaAs/Si and by means of forward- and revers...

High bandwidth-efficiency resonant cavity enhanced Schottky photodiodes for 800–850 nm wavelength operation

High-speed resonant cavity enhanced Schottky photodiodes operating in 800–850 nm wavelength region are demonstrated. The devices are fabricated in the AlGaAs/GaAs material system. The Schottky contact is a semitransparent Au film which also serves as the top reflector of the Fabry–Perot cavity. The detectors exhibit a peak quantum efficiency of η=0.5 at λ=827 nm wavelength and a 3 dB bandwidth of more than 50 GHz resulting in a bandwidth-efficiency product of more than 25 GHz.

Optical and structural study of GaN nanowires grown by catalyst-free molecular beam epitaxy. II. Sub-band-gap luminescence and electron irradiation effects

GaN nanowires with diameters of 50–250 nm, grown by catalyst-free molecular beam epitaxy, were characterized by photoluminescence (PL) and cathodoluminescence (CL) spectroscopy at temperatures from 3 to 297 K. Both as-grown samples and dispersions of the nanowires onto other substrates were examined. The properties of the near-band-edge PL and CL spectra were discussed in Part I of this study by [Robins et al. [L. H. Robins, K. A. Bertness, J. M. Barker, N. A. Sanford, and J. B. Schlager, J. Appl. Phys. 101,113505 (2007)]. Spectral features below the band gap, and the effect of extended electron irradiation on the CL, are discussed in Part II. The observed sub-band-gap PL and CL peaks are identified as phonon replicas of the free-exciton transitions, or excitons bound to structural defects or surface states. The defect-related peaks in the nanowires are correlated with luminescence lines previously reported in GaN films, denoted the Y lines [M. A. Reshchikov and H. Morkoc, J. Appl. Phys. 97, 061301 (2005)...

Optical constants of (Al0.98Ga0.02)xOy native oxides

We report the optical constants of oxidized crystalline and low-temperature-grown (LTG) Al0.98Ga0.02As films, as determined by variable angle spectroscopic ellipsometry. Data were acquired at three angles of incidence over 240–1700 nm and fitted to a Cauchy dispersion function. For oxidized crystalline material, we observe a variation in the real index of ±0.5% for layer thickness variations of ±6%. We show that upon oxidation, LTG material can expand by >25% while crystalline material contracts by <2%. Atomic force microscopy analysis indicates thickness-dependent variations in the oxide microstructure. Additionally, an optical scattering loss of 2.1×10−4%/pass is calculated based on surface roughness measurements for a thin layer of oxidized crystalline material.