Kunihiro Hosono

Scanning electron microscope for observation of cross section and method of observing cross section employing the same

Method of correcting defects in the pattern of phase shift mask

Method of repairing a mask

Apparatus and method for identifying photomask pattern defects

X-ray mask and exposure method employing the same

Photomask manufacturing method thereof, and semiconductor device

Phase shift mask and method for repairing a defect of a phase shift mask

Photo-mask, photo-mask pair, semiconductor device and method of manufacturing a semiconductor device

MANUFACTURING PROCESS FOR SEMICONDUCTOR DEVICE, PHOTOMASK, AND MANUFACTURING APPARATUS FOR SEMICONDUCTOR DEVICE

Method of selecting mask manufacturer of photomask