Kunihiro Ueda

Photoelectron Emission Study of Hydrogenated Amorphous Carbon Films Prepared by RF Plasma Chemical Vapor Deposition

The ultraviolet (UV) threshold energy for photoelectron emission of the carbon films synthesized by the RF plasma chemical vapor deposition (CVD) method with additional dc bias negative to the substrate was measured with an atmospheric UV photoelectron analyzer. The additional dc negative bias decreased the UV threshold energy and the amount of CH2 and CH3 groups (hydrogen content) of the carbon films, and increased the Vickers hardness and refractive index. The applied negative bias is considered to promote the formation of a network structure like that of diamond.