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Featured researches published by Kyuzo Nakamura.


Japanese Journal of Applied Physics | 1996

Preparation of (Pb, La) (Zr, Ti)O3 ferroelectric films by RF sputtering on large substrate

Koukou Suu; Akira Osawa; Noriaki Tani; Michio Ishikawa; Kyuzo Nakamura; Takanori Ozawa; Katsumi Sameshima; Akira Kamisawa; Hideshi Takasu

(Pb, La)(Zr, Ti)O 3 (PLZT) thin films were deposited on 6-inch Pt/Ti/SiO 2 /Si substrates by rf magnetron sputtering using a multichamber production system. The Pb content in PLZT films deposited at low temperature was measured by inductively coupled plasma (ICP) spectroscopy, and the structural properties of crystallized PLZT films were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). A novel method for Pb content control was developed and it was found that Pb content in PLZT film could be changed by changing the electric potential of the substrate. For ferroelectric properties, only small differences were observed between the rapid thermally annealed PLZT film and furnace- annealed ones. Good uniformities of film thickness, Pb content and remanent polarization were achieved on 6-inch wafers.


Japanese Journal of Applied Physics | 1984

A New Perpendicular Magnetic Film of Co–O by Evaporation

Kyuzo Nakamura; Noriaki Tani; Michio Ishikawa; Taiki Yamada; Yoshifumi Ota; Akio Itoh

A new perpendicular magnetic film has been developed by an evaporation method using room temperature substrates. The film is obtained by partially oxidating the Co film with the oxygen gas introduced during deposition. The film structure is a mixture of very fine Co grains and CoO phase. The obtained films have such superior perpendicular magnetic properties as Hc⊥=1100 Oe, Hk=5.5 kOe and 4πMs=6000 G at Co–45 at%O film composition.


Journal of the Acoustical Society of America | 1987

Apparatus for manufacturing of abrasion resistant magnetic recording product

Kyuzo Nakamura; Yoshifumi Ota

A method and apparatus for making an abrasion-resistant magnetic recording product comprising forming a magnetic film on the surface of a substrate in a vacuum container, and thereafter, vapor depositing a lubricant on the surface of the magnetic film in the same vacuum container. If necessary, the surface of the magnetic film can be oxidized in the same vacuum container, prior to vapor depositing the lubricant.


Archive | 1982

Ferromagnetic high speed sputtering apparatus

Kyuzo Nakamura; Yoshifumi Ohta; Taiki Yamada


Archive | 2009

Manufacturing method for solar cell

Hirohisa Takahashi; Satoru Ishibashi; Kyuzo Nakamura


Archive | 1990

Chemical vapor deposition apparatus of in-line type

Kyuzo Nakamura; Michio Ishikawa; Kazuyuki Ito; Noriaki Chiba Chozairyo Kenkyujo Tani; Masanori Hashimoto; Yoshifumi Ota


Archive | 1984

Optical magnetic recording member

Kyuzo Nakamura; Yoshifumi Ota; Tsutomu Asaka


Archive | 1994

Method of forming passivation film

Kazuyuki Ito; Kyuzo Nakamura; Michio Ishikawa; Jun Togawa; Noriaki Tani; Masanori Hashimoto; Yumiko Ohashi


Archive | 1986

Abrasion resistant magnetic recording member

Kyuzo Nakamura; Yoshifumi Ota; Taiki Yamada; Michio Ishikawa; Noriaki Tani


Archive | 1997

Formation of barrier film

Yasushi Higuchi; Satoshi Ikeda; Takashi Komatsu; Kenzo Nagano; Kyuzo Nakamura; Yoshifumi Ota; Yasuhiro Taguma; 久三 中村; 賀文 太田; 孝 小松; 靖 樋口; 智 池田; 康宏 田熊; 賢三 長野

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Hiroto Uchida

MITSUBISHI MATERIALS CORPORATION

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Katsuhiko Mori

National Institute of Advanced Industrial Science and Technology

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Satoru Ishibashi

MITSUBISHI MATERIALS CORPORATION

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