Satoru Ishibashi
MITSUBISHI MATERIALS CORPORATION
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Latest external collaboration on country level. Dive into details by clicking on the dots.
Publication
Featured researches published by Satoru Ishibashi.
SID Symposium Digest of Technical Papers | 2009
Satoru Takasawa; Satoru Ishibashi; Tadashi Masuda
The low resistivity Cu wiring process using under oxide layer of Cu or Cu alloy has good adhesion to the glass substrate and Si under-layer, and high barrier performance of prevention between Cu and Si interdiffusion. This Process is effective to enlarging TFT-LCD panel for high-definition TV.
Archive | 2009
Hirohisa Takahashi; Satoru Ishibashi; Kyuzo Nakamura
Archive | 2009
Satoru Takasawa; Masaki Takei; Hirohisa Takahashi; Hiroaki Katagiri; Sadayuki Ukishima; Noriaki Tani; Satoru Ishibashi; Tadashi Masuda
Archive | 2010
Hirohisa Takahashi; Satoru Takasawa; Isao Sugiura; Atsushi Ota; Satoru Ishibashi; Haruhiko Yamamoto
Archive | 2008
Hirohisa Takahashi; Satoru Ishibashi; Isao Sugiura; Satoru Takasawa
Archive | 2009
Satoru Takasawa; Masaki Takei; Hirohisa Takahashi; Hiroaki Katagiri; Sadayuki Ukishima; Noriaki Tani; Satoru Ishibashi; Tadashi Masuda
Archive | 2008
Hirohisa Takahashi; Satoru Ishibashi
Archive | 2007
Sadayuki Ukishima; Satoru Takasawa; Hideo Takei; Satoru Ishibashi
Archive | 2009
Satoru Takasawa; 悟 高澤; Satoru Ishibashi; 石橋 暁; Tadashi Masuda; 忠 増田
Archive | 2009
Satoru Takasawa; 悟 高澤; Satoru Ishibashi; 石橋 暁; Tadashi Masuda; 忠 増田
