Luis M. Traverso

High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field.

Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit and meet the ever-decreasing device dimensions. We report our recent experimental advancements to scale up diffraction unlimited optical lithography in a massive scale using the near field nanolithography capabilities of bowtie apertures. A record number of near-field optical elements, an array of 1,024 bowtie antenna apertures, are simultaneously employed to generate a large number of patterns by carefully controlling their working distances over the entire array using an optical gap metrology system. Our experimental results reiterated the ability of using massively-parallel near-field devices to achieve high-throughput optical nanolithography, which can be promising for many important nanotechnology applications such as computation, data storage, communication, and energy.

Sub-Diffraction Limited Writing based on Laser Induced Periodic Surface Structures (LIPSS).

Controlled fabrication of single and multiple nanostructures far below the diffraction limit using a method based on laser induced periodic surface structure (LIPSS) is presented. In typical LIPSS, multiple lines with a certain spatial periodicity, but often not well-aligned, were produced. In this work, well-controlled and aligned nanowires and nanogrooves with widths as small as 40 nm and 60 nm with desired orientation and length are fabricated. Moreover, single nanowire and nanogroove were fabricated based on the same mechanism for forming multiple, periodic structures. Combining numerical modeling and AFM/SEM analyses, it was found these nanostructures were formed through the interference between the incident laser radiation and the surface plasmons, the mechanism for forming LIPSS on a dielectric surface using a high power femtosecond laser. We expect that our method, in particular, the fabrication of single nanowires and nanogrooves could be a promising alternative for fabrication of nanoscale devices due to its simplicity, flexibility, and versatility.

High precision dynamic alignment and gap control for optical near-field nanolithography

The authors demonstrate the use of interferometric-spatial-phase-imaging (ISPI) to control a gap distance of the order of nanometers for parallel optical near-field nanolithography. In optical near-field nanolithography, the distance between the optical mask and the substrate needs to be controlled within tens of nanometers or less. The ISPI technique creates interference fringes from checkerboard gratings fabricated on the optical mask, which are used to determine the gap distance between the mask and the substrate surfaces. The sensitive of this gapping technique can reach 0.15 nm. With the use of ISPI and a dynamic feedback control system, the authors can precisely align the mask and the substrate and keep variation of the gap distance below 6 nm to realize parallel nanolithography.

Sub-diffraction Laser Synthesis of Silicon Nanowires

We demonstrate synthesis of silicon nanowires of tens of nanometers via laser induced chemical vapor deposition. These nanowires with diameters as small as 60 nm are produced by the interference between incident laser radiation and surface scattered radiation within a diffraction limited spot, which causes spatially confined, periodic heating needed for high resolution chemical vapor deposition. By controlling the intensity and polarization direction of the incident radiation, multiple parallel nanowires can be simultaneously synthesized. The nanowires are produced on a dielectric substrate with controlled diameter, length, orientation, and the possibility of in-situ doping, and therefore are ready for device fabrication. Our method offers rapid one-step fabrication of nano-materials and devices unobtainable with previous CVD methods.

Design and fabrication of electrostatic microcolumn in multiple electron-beam lithography

Microcolumns are widely used for parallel electron-beam lithography because of their compactness and the ability to achieve high spatial resolution. A design of an electrostatic microcolumn for our recent nanoscale photoemission sources is presented. We proposed a compact column structure (as short as several microns in length) for the ease of microcolumn fabrication and lithography operation. We numerically studied the influence of several design parameters on the optical performance such as microcolumn diameter, electrode thickness, beam current, working voltages, and working distance. We also examined the effect of fringing field between adjacent microcolumns during parallel lithography operations. The microcolumns were also fabricated to show the possibility.

Subdiffraction light focusing using a cross sectional ridge waveguide nanoscale aperture

We report a new type of plasmonic nanoscale ridge aperture and its fabrication process which is based on layer-by-layer planar lithography. This new fabrication method allows us to create desired nanoscale features of a plasmonic ridge waveguide nanoscale aperture, which helps to confine a near-field spot to sub-wavelength dimensions. Numerical simulations using Finite Element Method (FEM) are performed to calculate the near-field distribution around the exit of the aperture. Measurements using scattering near-field scanning optical microscopy (s-NSOM) confirm the design and demonstrate that the aperture is capable of producing focused spots in the ridge gap at the exit of the aperture. The planar lithography process is a step toward mass production of such plasmonic structures for applications including heat-assisted magnetic recording (HAMR).

Optothermal response of plasmonic nanofocusing lens under picosecond laser irradiation

This work studied the optothermal response of plasmonic nanofocusing structures under picosecond pulsed laser irradiation. The surface plasmon polariton is simulated to calculate the optical energy dissipation as the Joule heating source and the thermal transport process is studied using a two temperature model (TTM). At the picosecond time scale that we are interested in, the Fourier heat equation is used to study the electron thermal transport and the hyperbolic heat equation is used to study the lattice thermal transport. For comparison, the single temperature model (STM) is also studied. The difference between TTM and STM indicates that TTM provides more accurate estimates in the picosecond time scale and the STM results are only reliable when the local electron and lattice temperature difference is negligible.