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Lynne A. Okada

Advanced Micro Devices

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Publication

Featured researches published by Lynne A. Okada.

Archive | 2001

Post-treatment of low-k dielectric for prevention of photoresist poisoning

Lynne A. Okada; Fei Wang; Calvin T. Gabriel

Archive | 2002

Air gap dual damascene process and structure

Fei Wang; Lynne A. Okada

Archive | 2001

Method for using a CVD organic barc as a hard mask during via etch

Ramkumar Subramanian; Fei Wang; Todd P. Lukanc; Lynne A. Okada

Archive | 2001

Method of manufacturing a semiconductor structure with treatment to sacrificial stop layer producing diffusion to an adjacent low-k dielectric layer lowering the constant

Calvin T. Gabriel; Suzette K. Pangrle; Lynne A. Okada; Fei Wang

Archive | 2001

Plasma etch process for nonhomogenous film

Calvin T. Gabriel; Lynne A. Okada; Dawn M. Hopper; Suzette K. Pangrle; Fei Wang

Archive | 2001

Dielectric layer with treated top surface forming an etch stop layer and method of making the same

Calvin T. Gabriel; Lynne A. Okada

Archive | 2001

Via filled dual damascene structure with middle stop layer and method for making the same

Fei Wang; Lynne A. Okada; Ramkumar Subramanian; Calvin T. Gabriel

Archive | 2001

Method of making a slot via filled dual damascene structure with middle stop layer

Fei Wang; Lynne A. Okada; Ramkumar Subramanian; Calvin T. Gabriel

Archive | 2001

Integration of organic fill for dual damascene process

Lynne A. Okada; Fei Wang; James K. Kai

Archive | 2001

Silicon carbide barc in dual damascene processing

Ramkumar Subramanian; Fei Wang; Lynne A. Okada; Calvin T. Gabriel; Darrell M. Erb

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Collaboration

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Fei Wang

Advanced Micro Devices

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Calvin T. Gabriel

Advanced Micro Devices

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Ramkumar Subramanian

Advanced Micro Devices

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Lu You

Advanced Micro Devices

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Suzette K. Pangrle

Advanced Micro Devices

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James K. Kai

Advanced Micro Devices

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Minh Quoc Tran

Advanced Micro Devices

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Dawn M. Hopper

Advanced Micro Devices

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Barry Dick

Advanced Micro Devices

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Darrell M. Erb

Advanced Micro Devices

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