M. Cazzanelli

Second-harmonic generation in silicon waveguides strained by silicon nitride

Silicon photonics meets the electronics requirement of increased speed and bandwidth with on-chip optical networks. All-optical data management requires nonlinear silicon photonics. In silicon only third-order optical nonlinearities are present owing to its crystalline inversion symmetry. Introducing a second-order nonlinearity into silicon photonics by proper material engineering would be highly desirable. It would enable devices for wideband wavelength conversion operating at relatively low optical powers. Here we show that a sizeable second-order nonlinearity at optical wavelengths is induced in a silicon waveguide by using a stressing silicon nitride overlayer. We carried out second-harmonic-generation experiments and first-principle calculations, which both yield large values of strain-induced bulk second-order nonlinear susceptibility, up to 40 pm V(-1) at 2,300 nm. We envisage that nonlinear strained silicon could provide a competing platform for a new class of integrated light sources spanning the near- to mid-infrared spectrum from 1.2 to 10 μm.

Size dependence of lifetime and absorption cross section of Si nanocrystals embedded in SiO2

Photoluminescence lifetimes and optical absorption cross sections of Si nanocrystals embedded in SiO 2 have been studied as a function of their average size and emission energy. The lifetimes span from 20 μs for the smallest sizes (2.5 nm) to more than 200 μs for the largest ones (7 nm). The passivation of nonradiative interface states by hydrogenation increases the lifetime for a given size. In contrast with porous Si, the cross section per nanocrystal shows a nonmonotonic behavior with emission energy. In fact, although the density of states above the gap increases for larger nanocrystals, this trend is compensated by a stronger reduction of the oscillator strength, providing an overall reduction of the absorption cross section per nanocrystal for increasing size.

Stimulated emission in nanocrystalline silicon superlattices

We studied the conditions under which optical gain is measured in nanocrystalline silicon (nc-Si) using the variable stripe length method. Waveguide samples have been produced by magnetron sputtering of alternating layers of Si and SiO2, followed by high temperature annealing. No optical gain was observed under continuous wave pumping conditions. Under high intensity pulsed excitation, a superlinear fast (10 ns) recombination component yielding an optical gain up to 50 cm−1 has been independently measured in two different laboratories. A control experiment confirmed that the presence of nc-Si is necessary to achieve gain in our structures.

Dynamics of stimulated emission in silicon nanocrystals

Time-resolved luminescence measurements on silicon nanocrystal waveguides obtained by thermal annealing of plasma-enhanced chemical-vapor-deposited thin layers of silicon-rich oxide have revealed fast recombination dynamics related to population inversion which leads to net optical gain. Variable stripe length measurements performed on the fast emission signal have shown an exponential growth of the amplified spontaneous emission with net gain values of about 10 cm−1. The fast emission component is strongly dependent on the pumping length for fixed excitation intensity. In addition, both the fast component intensity and its temporal decay revealed threshold behavior as a function of the incident pump intensity.

Nonlinear optical properties of silicon nanocrystals grown by plasma-enhanced chemical vapor deposition

The real and imaginary parts of third-order nonlinear susceptibility χ(3) have been measured for silicon nanocrystals embedded in SiO2 matrix, formed by high temperature annealing of SiOx films prepared by plasma-enhanced chemical vapor deposition. Measurements have been performed using a femtosecond Ti–sapphire laser at 813 nm using the Z-scan technique with maximum peak intensities up to 2×1010 W/cm2. The real part of χ(3) shows positive nonlinearity for all samples. Intensity-dependent nonlinear absorption is observed and attributed to two-photon absorption processes. The absolute value of χ(3) is on the order of 10−9 esu and shows a systematic increase as the silicon nanocrystalline size decreases. This is due to quantum confinement effects.

Stimulated emission in plasma-enhanced chemical vapour deposited silicon nanocrystals

Abstract Observation of optical gain in silicon nanocrystals (Si-nc) is critically dependent on a very delicate balance among the Si-nc gain cross-sections, the optical mode losses and confinement factors of the waveguide structures, the Si-nc concentration and the strongly competing fast non-radiative Auger processes. Here we report on optical gain measurements by variable stripe length (VSL) method on a set of silicon nanocrystals formed by thermal annealing at 1250°C of SiO x films with different silicon contents prepared by plasma-enhanced chemical vapour deposition. Time-resolved VSL has revealed fast component in the recombination dynamics under gain conditions. Fast lifetime narrowing and superlinear emission has been unambiguously observed. To explain our experimental results we propose a four levels recombination model. Within a phenomenological rate equations description including Auger processes and amplified spontaneous emission we obtained a satisfactory agreement with time-resolved experiments and explained the strong competition between stimulated emission and fast non-radiative Auger processes.

Bound electronic and free carrier nonlinearities in Silicon nanocrystals at 1550nm

We present a detailed investigation of the different processes responsible for the optical nonlinearities of silicon nanocrystals at 1550 nm. Through z-scan measurements, the bound-electronic and excited carrier contributions to the nonlinear refraction were measured in presence of two-photon absorption. A study of the nonlinear response at different excitation powers has permitted to determine the change in the refractive index per unit of photo-excited carrier density sigma(r) and the value of the real bound-electronic nonlinear refraction n(2be) as a function of the nanocrystals size. Moreover at high excitation power, a saturation of the nonlinear absorption was observed due to band-filling effects.

Linear and nonlinear optical properties of Si nanocrystals in SiO2 deposited by plasma-enhanced chemical-vapor deposition

Linear and nonlinear optical properties of silicon suboxide SiOx films deposited by plasma-enhanced chemical-vapor deposition have been studied for different Si excesses up to 24at.%. The layers have been fully characterized with respect to their atomic composition and the structure of the Si precipitates. Linear refractive index and extinction coefficient have been determined in the whole visible range, enabling to estimate the optical bandgap as a function of the Si nanocrystal size. Nonlinear optical properties have been evaluated by the z-scan technique for two different excitations: at 0.80eV in the nanosecond regime and at 1.50eV in the femtosecond regime. Under nanosecond excitation conditions, the nonlinear process is ruled by thermal effects, showing large values of both nonlinear refractive index (n2∼−10−8cm2∕W) and nonlinear absorption coefficient (β∼10−6cm∕W). Under femtosecond excitation conditions, a smaller nonlinear refractive index is found (n2∼10−12cm2∕W), typical of nonlinearities arisi...

Optical gain in monodispersed silicon nanocrystals

Stimulated emission from silicon-nanocrystal planar waveguides grown via phase separation and thermal crystallization of SiO∕SiO2 superlattices is presented. Under high power pulsed excitation, positive optical gain can be observed once a good optical confinement in the waveguide is achieved and the silicon nanocrystals have proper size. A critical tradeoff between Auger nonradiative recombination processes and stimulated emission is observed. The measured large gain values are explained by the small size dispersion in these silicon nanocrystals.

Linear and nonlinear optical properties of plasma-enhanced chemical-vapour deposition grown silicon nanocrystals

We provide a systematic study on the linear and nonlinear optical properties of silicon nanocrystals (Si-nc) grown by plasma-enhanced chemical vapour deposition (PECVD). Linear optical properties, namely absorption, emission and refractive indices are reported. The sign and magnitude of both real and imaginary parts of third-order nonlinear susceptibility X(3) of Si-nc are measured by the Z-scan method. Closed aperture Z-scan reveals a positive nonlinearity for all the samples. From the open aperture measurements, nonlinear absorption coefficients are evaluated and attributed to two-photon absorption. Absolute values of X(3) are in the order of 10-9 esu and show systematic correlation with the Si-nc size, due to quantum confinement related effects. A correlation has been made between X(3), nanocrystalline size, linear refractive index and optical band gap.