N. Daldosso

Ultrafast All-Optical Switching in a Silicon-Nanocrystal-Based Silicon Slot Waveguide at Telecom Wavelengths

We demonstrate experimentally all-optical switching on a silicon chip at telecom wavelengths. The switching device comprises a compact ring resonator formed by horizontal silicon slot waveguides filled with highly nonlinear silicon nanocrystals in silica. When pumping at power levels about 100 mW using 10 ps pulses, more than 50% modulation depth is observed at the switch output. The switch performs about 1 order of magnitude faster than previous approaches on silicon and is fully fabricated using complementary metal oxide semiconductor technologies.

Stimulated emission in plasma-enhanced chemical vapour deposited silicon nanocrystals

Abstract Observation of optical gain in silicon nanocrystals (Si-nc) is critically dependent on a very delicate balance among the Si-nc gain cross-sections, the optical mode losses and confinement factors of the waveguide structures, the Si-nc concentration and the strongly competing fast non-radiative Auger processes. Here we report on optical gain measurements by variable stripe length (VSL) method on a set of silicon nanocrystals formed by thermal annealing at 1250°C of SiO x films with different silicon contents prepared by plasma-enhanced chemical vapour deposition. Time-resolved VSL has revealed fast component in the recombination dynamics under gain conditions. Fast lifetime narrowing and superlinear emission has been unambiguously observed. To explain our experimental results we propose a four levels recombination model. Within a phenomenological rate equations description including Auger processes and amplified spontaneous emission we obtained a satisfactory agreement with time-resolved experiments and explained the strong competition between stimulated emission and fast non-radiative Auger processes.

Comparison among various Si/sub 3/N/sub 4/ waveguide geometries grown within a CMOS fabrication pilot line

Low-pressure chemical-vapor deposition (LPCVD) thin-film Si/sub 3/N/sub 4/ waveguides have been fabricated on Si substrate within a complementary metal-oxide-semiconductor (CMOS) fabrication pilot line. Three kinds of geometries (channel, rib, and strip-loaded) have been simulated, fabricated, and optically characterized in order to optimize waveguide performances. The number and optical confinement factors of guided optical modes have been simulated, taking into account sidewall effects caused by the etching processes, which have been studied by scanning electron microscopy. Optical guided modes have been observed with a mode analyzer and compared with simulation expectations to confirm the process parameters. Propagation loss measurements at 780 and 632.8 nm have been performed by both using the cutback technique and measuring the drop of intensity of the top scattered light along the length of the waveguide. Loss coefficients of approximately 0.1 dB/cm have been obtained for channel waveguides. These data are very promising in view of the development of Si-integrated photonics.

Absorption cross section and signal enhancement in Er-doped Si nanocluster rib-loaded waveguides

Pump and probe experiments on Er3+ ions coupled to Si nanoclusters have been performed in rib-loaded waveguides to investigate optical amplification at 1.5μm. Rib-loaded waveguides were obtained by photolithographic and reactive ion etching of Er-doped silica layers containing Si nanoclusters grown by reactive sputtering. Insertion losses measurements in the infrared erbium absorption region allowed to gauge an Er3+ absorption cross section of about 5×10−21cm2 at 1534nm. Signal transmission under optical pumping at 1310nm shows confined carrier absorption of the Si nanoclusters. Amplification experiments at 1535nm evidence two pump power regimes: Losses due to confined carrier absorption in the Si nanoclusters at low pump powers and signal enhancement at high pump powers. For strong optical pumping, signal enhancement of about 1.2dB∕cm was obtained.

Bound electronic and free carrier nonlinearities in Silicon nanocrystals at 1550nm

We present a detailed investigation of the different processes responsible for the optical nonlinearities of silicon nanocrystals at 1550 nm. Through z-scan measurements, the bound-electronic and excited carrier contributions to the nonlinear refraction were measured in presence of two-photon absorption. A study of the nonlinear response at different excitation powers has permitted to determine the change in the refractive index per unit of photo-excited carrier density sigma(r) and the value of the real bound-electronic nonlinear refraction n(2be) as a function of the nanocrystals size. Moreover at high excitation power, a saturation of the nonlinear absorption was observed due to band-filling effects.

Linear and nonlinear optical properties of Si nanocrystals in SiO2 deposited by plasma-enhanced chemical-vapor deposition

Linear and nonlinear optical properties of silicon suboxide SiOx films deposited by plasma-enhanced chemical-vapor deposition have been studied for different Si excesses up to 24at.%. The layers have been fully characterized with respect to their atomic composition and the structure of the Si precipitates. Linear refractive index and extinction coefficient have been determined in the whole visible range, enabling to estimate the optical bandgap as a function of the Si nanocrystal size. Nonlinear optical properties have been evaluated by the z-scan technique for two different excitations: at 0.80eV in the nanosecond regime and at 1.50eV in the femtosecond regime. Under nanosecond excitation conditions, the nonlinear process is ruled by thermal effects, showing large values of both nonlinear refractive index (n2∼−10−8cm2∕W) and nonlinear absorption coefficient (β∼10−6cm∕W). Under femtosecond excitation conditions, a smaller nonlinear refractive index is found (n2∼10−12cm2∕W), typical of nonlinearities arisi...

Propagation losses of silicon nitride waveguides in the near-infrared range

Si3N4∕SiO2 waveguides have been fabricated by low pressure chemical vapor deposition within a complementary metal–oxide–semiconductor fabrication pilot line. Propagation losses for different waveguide geometries (channel and rib loaded) have been measured in the near infrared as a function of polarization, waveguide width, and light wavelength. A maximum thickness of single Si3N4 of 250 nm is allowed by the large stress between Si3N4 and SiO2. This small thickness turns into significant propagation losses at 1544 nm of about 4.5dB∕cm because of the poor optical mode confinement factor. Strain release and control is possible by using multilayer waveguides by alternating Si3N4 and SiO2 layers. In this way, propagation losses of about 1.5dB∕cm have been demonstrated thanks to an improved optical mode confinement factor and the good quality of the interfaces in the waveguide.

Silicon nanocrystal formation in annealed silicon-rich silicon oxide films prepared by plasma enhanced chemical vapor deposition

Silicon-rich silicon oxide films deposited by plasma enhanced chemical vapor deposition with different total Si contents (from 39to46at.%) have been annealed at increasing temperature (up to 1250°C) in order to study the Si nanocrystal (Si-nc) nucleation as well as the structural changes induced in the amorphous embedding matrix. The comparison between x-ray absorption measurements in total electron yield mode, Raman spectroscopy, and photoluminescence spectra allowed us to gain insight about the Si nanocrystal formation, while the chemical composition and the nature of chemical bonds into the oxidized matrix was studied by Fourier transform infrared spectroscopy. A comprehensive picture of the nucleation process has been obtained, demonstrating the active role played by the hydrogen and nitrogen atoms in the formation of Si-nc and in the thermally induced evolution of the deposited films.

Optical gain in monodispersed silicon nanocrystals

Stimulated emission from silicon-nanocrystal planar waveguides grown via phase separation and thermal crystallization of SiO∕SiO2 superlattices is presented. Under high power pulsed excitation, positive optical gain can be observed once a good optical confinement in the waveguide is achieved and the silicon nanocrystals have proper size. A critical tradeoff between Auger nonradiative recombination processes and stimulated emission is observed. The measured large gain values are explained by the small size dispersion in these silicon nanocrystals.

Silicon Nanocrystals as an Enabling Material for Silicon Photonics

Silicon nanocrystals (Si-nc) is an enabling material for silicon photonics, which is no longer an emerging field of research but an available technology with the first commercial products available on the market. In this paper, properties and applications of Si-nc in silicon photonics are reviewed. After a brief history of silicon photonics, the limitations of silicon as a light emitter are discussed and the strategies to overcome them are briefly treated, with particular attention to the recent achievements. Emphasis is given to the visible optical gain properties of Si-nc and to its sensitization effect on Er ions to achieve infrared light amplification. The state of the art of Si-nc applied in a few photonic components is reviewed and discussed. The possibility to exploit Si-nc for solar cells is also presented. In addition, nonlinear optical effects, which enable fast all-optical switches, are described.