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electronic components and technology conference | 1994

Fluxless soldering process technology

Toru Nishikawa; Masahito Ijuin; Ryohei Satoh; Y. Iwata; M. Tamura; M. Shirai

This paper describes a reflow soldering process not requiring the use of flux. There are basically two fluxless soldering processes. Initially, we developed a process in which an argon-atom sputter-etching technique is employed to clean the surface, and reoxidation is prevented by carrying out aligning, mounting, and reflowing in an inert gas in a vacuum chamber. Then, for purposes of simplification, we developed a more convenient process in which, following the surface cleaning, the aligning and mounting are done in an atmosphere of ordinary air and then the reflowing is done in a belt furnace. This causes the reoxidation on surfaces activated by sputter-etching to be approximately the same both in a vacuum and in an air at room temperature. The thin oxide film is easy to break by volume expansion when it is melted. This allows the solder to wet. Applications to F.C.B. (Flip Chip Bonding) are possible between Au-metallized Ni surfaces and two types of solder (Pb3.6Sn and Sn3Ag). Excellent soldering results have been obtained using this new process. Basic characterization of a soldering process is determined by wettability tests. After sputter-etching, samples can be stored in air for one week. Oxygen density in a reflow atmosphere is allowed to reach 20 ppm. Based on our evaluations, it is concluded that this process is simple and convenient for manufacturing circuits.<<ETX>>


Archive | 1996

Method of fabricating an electronic circuit device

Toru Nishikawa; Ryohei Satoh; Masahide Hara; Tetsuya Hayashida; Mitugu Shirai; Osamu Yamada; Hiroko Takehara; Yasuhiro Iwata; Mitsunori Tamura; Masahito Ijuin


Archive | 2000

Process for manufacturing electronic circuit devices

Masahito Ijuin; Toru Nishikawa; Ryohei Sato; Mitsugu Shirai; Yuzo Taniguchi; Kosuke Inoue; Masahide Harada; Tetsuya Hayashida


Archive | 1994

Soldering method and apparatus for use in connecting electronic circuit devices

Toru Nishikawa; Masahito Ijuin; Ryohei Sato; Mitsugu Shirai


Archive | 1995

Manufacture of electronic circuit

Masahito Ijuin; Yasuhiro Iwata; Toru Nishikawa; Ryohei Sato; Hiroko Takehara; Mitsunori Tamura; Osamu Yamada; 正仁 伊集院; 了平 佐藤; 収 山田; 泰宏 岩田; 光範 田村; 裕子 竹原; 徹 西川


Archive | 1997

Manufacturing method for gas discharge type display panel

Michifumi Kawai; Ryohei Satoh; Masahito Ijuin; Tomohiko Murase; Takao Terabayashi; Nobuyuki Ushifusa; Yoshihiro Kato; Shigeaki Suzuki; Seiichi Tsuchida; Yutaka Naito; Seiichi Yasumoto; Osami Kaneto


Archive | 1997

Gas discharge type display panel, manufacturing method for gas discharge type display panel, and displaying arrangement using gas discharge type display panel

Masahito Ijuin; Osami Kaneto; Yoshihiro Kato; Michifumi Kawai; Tomohiko Murase; Yutaka Naito; Ryohei Satoh; Shigeaki Suzuki; Takao Terabayashi; Seiichi Tsuchida; Nobuyuki Ushifusa; Seiichi Yasumoto


Archive | 2002

Method of making gas discharge display panel and gas discharge display device

Masashi Nishiki; Ryohei Satoh; Yuzo Taniguchi; Shigeaki Suzuki; Michifumi Kawai; Masahito Ijuin; Akira Yabushita; Tomohiro Murase


Archive | 2001

Wiring substrate and gas discharge display device that includes a dry etched layer wet-etched first or second electrodes

Masashi Nishiki; Ryohei Satoh; Yuzo Taniguchi; Shigeaki Suzuki; Michifumi Kawai; Masahito Ijuin; Akira Yabushita; Makoto Fukushima; Tomohiko Murase


Archive | 2002

Wiring substrate and gas discharge display device

Masashi Nishiki; Ryohei Satoh; Yuzo Taniguchi; Shigeaki Suzuki; Michifumi Kawai; Masahito Ijuin; Akira Yabushita; Makoto Fukushima; Tomohiko Murase

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