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Michael Flugel

Eastman Kodak Company

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Publication

Featured researches published by Michael Flugel.

Archive | 2004

Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon

Harald Baumann; Udo Dwars; Detlef Pietsch; Michael Flugel

Archive | 2004

Radiation-sensitive compositions and imageable elements based thereon

Harald Baumann; Udo Dwars; Michael Flugel

Archive | 2003

Radiation-sensitive elements

Harald Baumann; Michael Flugel; Udo Dwars

Archive | 2003

Photopolymer composition suitable for lithographic printing plates

Harald Baumann; Michael Flugel; Udo Dwars; Hans Glatt

Archive | 2003

Radiation-sensitive elements and their storage stability

Harald Baumann; Michael Flugel; Udo Dwars; Eduard Kottmair

Archive | 2003

Visible radiation sensitive composition

Harald Baumann; Michael Flugel

Archive | 2002

Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates

Harald Baumann; Michael Flugel; Eduard Kottmair

Archive | 2003

Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente

Harald Baumann; Udo Dwars; Michael Flugel

Archive | 2010

Imageable elements with colorants

Christopher Simpson; Harald Baumann; Joachim Pengler; Michael Flugel

Archive | 2006

Process for the production of lithographic printing plates

Harald Baumann; Ulrich Fiebag; Udo Dwars; Bernd Strehmel; Michael Flugel; Hans-Joachim Timpe

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Collaboration

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Harald Baumann

University of Stuttgart

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Udo Dwars

Sun Chemical

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Bernd Strehmel

Eastman Kodak Company

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Christopher Simpson

Eastman Kodak Company

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Hans-Joachim Timpe

Technische Hochschule

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Ulrich Fiebag

Eastman Kodak Company

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Detlef Pietsch

Eastman Kodak Company

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Harald Baumann

University of Stuttgart

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Akira Igarashi

Eastman Kodak Company

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Saija Werner

Eastman Kodak Company

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