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Udo Dwars

Sun Chemical

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Publication

Featured researches published by Udo Dwars.

Archive | 1996

Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates

Harald Baumann; Udo Dwars; Celin Savariar-Hauck; Hans-Joachim Timpe

Archive | 2004

Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon

Harald Baumann; Udo Dwars; Detlef Pietsch; Michael Flugel

Archive | 1998

Overcoat for light-sensitive materials comprising a (1-vinylimidazole) polymer or copolymer

Socrates Peter Pappas; Harald Baumann; Udo Dwars; Celin Savariar-Hauck; Hans-Joachim Timpe

Archive | 2004

Radiation-sensitive compositions and imageable elements based thereon

Harald Baumann; Udo Dwars; Michael Flugel

Archive | 2003

Radiation-sensitive elements

Harald Baumann; Michael Flugel; Udo Dwars

Archive | 2005

Lithographic Printing Plate Precursors with Oligomeric Or Polymeric Sensitizers

Bernd Strehmel; Harald Baumann; Udo Dwars; Detlef Pietsch; Axel Draber; Michael Mursal

Archive | 2000

On press developable printing plate precursor

Harald Baumann; Udo Dwars

Archive | 2003

Photopolymer composition suitable for lithographic printing plates

Harald Baumann; Michael Flugel; Udo Dwars; Hans Glatt

Archive | 2003

Radiation-sensitive elements and their storage stability

Harald Baumann; Michael Flugel; Udo Dwars; Eduard Kottmair

Archive | 1997

Amido substituted acetal polymer binders and their use in photosensitive compositions

Harald Baumann; Udo Dwars; Celin Savariar-Hauck; Hans-Joachim Timpe

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Collaboration

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Harald Baumann

University of Stuttgart

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Michael Flugel

Eastman Kodak Company

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Hans-Joachim Timpe

Technische Hochschule

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Celin Savariar-Hauck

Sun Chemical

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Bernd Strehmel

Eastman Kodak Company

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Axel Draber

Eastman Kodak Company

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Detlef Pietsch

Eastman Kodak Company

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Christopher Simpson

Eastman Kodak Company

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Harald Baumann

University of Stuttgart

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Socrates Peter Pappas

Eastman Kodak Company

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