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Featured researches published by Mitsushi Itano.


Archive | 1998

Particle Adhesion and Removal on Wafer Surfaces in RCA Cleaning

Mitsushi Itano; Takehiko Kezuka

The fundamental interactions occurring between particles and the wafer surface in solutions are the van der Waals force (a molecular reciprocal action) and the electrostatic force (the reciprocal action of an electrical double layer). Research related to the particle adhesion mechanism on wafer surfaces in solutions that conform to the above two actions has thrived in recent years, and has done much to clarify the particle adhesion mechanism [1–12].


Archive | 2003

Etchant and etching method

Mitsushi Itano; Takashi Kanemura; Hiroshi Yodogawa Seisakusho Momota; Daisuke Watanabe


Archive | 1996

Wafer-cleaning solution and process for the production thereof

Takehiko Kezuka; Makoto Suyama; Fumihiro Kamiya; Mitsushi Itano


Archive | 1992

TREATMENT FOR SURFACE OF SILICON WAFER

Mitsushi Itano; Takehiko Kezuka; Motonobu Kubo; Shigeru Maruyama; 茂 丸山; 元伸 久保; 充司 板野; 健彦 毛塚


Archive | 2002

Composition for cleaning

Mitsushi Itano; Takehiko Kezuka


Archive | 1999

Etching solution, etched article and method for etched article

Takehiko Kezuka; Makoto Suyama; Mitsushi Itano


Archive | 1996

METHOD OF CLEANING SUBSTRATES

Mitsushi Itano; Takehiko Kezuka; Makoto Suyama


Archive | 1994

Wet etching composition having excellent wetting property for semiconductors

Masao Ishii; Tomohiro Hosomi; Shigeru Maruyama; Mitsushi Itano


Archive | 2004

Liquid for removing degenerated metal layer and method for removing degenerated metal layer

Shingo Nakamura; Shinichi Minami; Takashi Kanemura; Mitsushi Itano; Takehiko Kezuka; Fumihiro Kamiya


Microelectronic Engineering | 2009

High selectivity (SiN/SiO2) etching using an organic solution containing anhydrous HF

Daisuke Watanabe; Hidemitsu Aoki; Mitsushi Itano; Takeshi Kezuka; Chiharu Kimura; Takashi Sugino

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