Moriaki Akazawa

Method of treating semiconductor substrate surface and method of manufacturing semiconductor device including such treating method

Semiconductor wafer treating device utilizing a plasma

Manufacturing method of a semiconductor device with a trench capacitor

Method for cleaning semiconductor devices

Plasma etching method with enhanced anisotropic property and apparatus thereof

Semiconductor memory with laminated layers - which consist of insulating layers with sandwiched conductive layer on semiconductor substrate

Semiconductor device with capacitor and method of manufacturing thereof

Plasma processing apparatus including an electromagnet with a bird cage core

Cleaning semiconductors during mfr. - applying reactive gas and using plasma produced in vessel processing substrate

Mfg. semiconductor component with first film on substrate - includes forming etching mask with aperture on films, leaving part of film free