N. N. Salashchenko

Cr /sc multilayers for the soft-x-ray range.

We have systematically investigated ultrathin Cr/Sc multilayers (nanolayers), using tunable soft-x-ray synchrotron radiation. The multilayers were optimized for use either in normal incidence or at 45 degrees at photon energies around the 2p-absorption edges of Sc (399 eV) and Cr (574 eV), respectively. They were sputter deposited on Si wafers or on thin Si(3)N(4)-membrane support structures for use in reflection and in transmission, respectively, as polarizing and phase-retarding elements in a polarimeter. The performance theoretically expected with respect to reflection/transmission and energy resolution has been confirmed experimentally: A value of 7% for the normal-incidence peak reflectance at 395 eV was measured as well as a pronounced minimum in transmission for certain incidence angles and energies below the respective absorption edges, indicating significant phase-shifting effects.

Multilayer optics for XUV spectral region: technology fabrication and applications

We present research investigations in the field of multilayer optics in X-ray and extreme ultra-violet ranges (XUV), aimed at the development of optical elements for applications in experiments in physics and in scientific instrumentation. We discuss normal incidence multilayer optics in the spectral region of “water window”, multilayer optics for collimation and focusing of hard X-ray, multilayer dispersing elements for X-ray spectroscopy of high-temperature plasma, multilayer dispersing elements for analysis of low Z-elements. Our research pays special attention to optimization of multilayer optics for projection EUV-lithography (ψ-13nm) and short period multilayer optics.

Multilayer X-ray mirrors based on La/B4C and La/B9C

Multilayer X-ray mirrors that are based on La/B4C and La/B9C and intended for the reflection of X-ray radiation in the spectral region near λ = 6.7 nm are prepared and studied. Reflection coefficients at a level of 40–60% are achieved for mirrors with various periods. The difference in the interlayer roughnesses reconstructed from the data measured in the hard and soft X-ray spectral regions is explained using a structural model with an asymmetric permittivity profile in a mirror period. A proximate technique is developed to estimate the permittivity profile in a multilayer-structure period using reflectometry data. The effect of antidiffusion Sn, Cr, and Mo barriers on the reflection coefficient of multilayer La/B4C structures is studied experimentally

Multilayer Zr/Si filters for EUV lithography and for radiation source metrology

The technique for fabrication of thin film filters with high mechanical strength, capable of withstanding the prolonged heat load of 1 W/cm2, has been developed. Freestanding multilayer Zr/Si filters of size 20×150 mm2 with high transparency of 76% at wavelength λ = 13 nm were manufactured for EUV lithography tool. We have also developed and fabricated various designs of filters (freestanding or mesh supported) with lower transparency of 40-50% for experiments with intensive EUV sources. The tests of differential pressure withstandability and heat-resistance of filter samples were fulfilled. In order to model the influence on the filter of intensive radiation of the lithography source we have tested Zr/Si film samples by the Joule heating in vacuum at residual pressure of 10-8 Torr. The testing consisted in continuous heating of Zr/Si films at the electrical power per area unit from 0.5 W/cm2 to 6 W/cm2 during long period of time (up to 2 months). The influence of the long-term heat load on the transparency of samples at λ = 13 nm and within wavelength region 0.3 - 2 μm was investigated.

Determination of layered synthetic microstructure parameters

Abstract A method for determining the parameters of real layered synthetic microstructures (LSMs) of superthin films (the layer thickness is about 1–10 nm) is discussed. This method is based on the analysis of small angle X-ray diffraction spectra (λ≈0.1 nm). The following LSM parameters have been determined: (1) concentration of atoms in the layers; (2) thickness of the layers and thickness of the interface between the LSM constituent layers; (3) characteristics of the layer thickness fluctuations. The Ni-C and Ni-Ti structures serve to illustrate the method. The potentialities of this technique in superthin film growth and diffusion investigation are demonstrated.

A source of a reference spherical wave based on a single mode optical fiber with a narrowed exit aperture

A new type of a reference spherical wave source (SWS) based on a single mode optical fiber with a narrowed down up to the submicrometer size exit aperture is proposed. It is intended for the precision point diffraction interferometers as a source of a reference wave. Systematic experimental errors which influence the measurement accuracy of the quality of the wave fronts generated by the SWSs are considered. Experimental data on wave front deformations are given. The combined root-mean-square (rms) wave deformation for a couple of the SWSs measured in a numerical aperture of NA=0.27 reaches the value of rms=0.36 nm that corresponds to rms=0.25 nm of a single SWS or about lambda2500 for the red He-Ne laser.

Free-standing spectral purity filters for extreme ultraviolet lithography

Free-standing multilayer films consisting of Si, Zr, Mo and silicides of both metals have been fabricated and studied as spectral purity filters (SPF) for extreme ultraviolet (EUV) (13.5 nm) lithography tools. Comparative tests of multilayer SPF structures of various compositions have been performed at high power loads. It was found that a Mo/ZrSi2 structure with MoSi2 capping layers is featured with capability to withstand prolonged heating in vacuum (10−7  mbar) at 900-950°C. A technique of fabrication of large aperture free-standing multilayers was developed, and a pilot sample of the above film structure of 160 mm in diameter, 50 nm thick, with transparency at 13.5 nm above 70% was fabricated as a conceptual prototype of SPFs with large dimensions.

Roughness measurement and ion-beam polishing of super-smooth optical surfaces of fused quartz and optical ceramics

The main problems and the approach used by the authors for roughness metrology of super-smooth surfaces designed for diffraction-quality X-ray mirrors are discussed. The limitations of white light interferometry and the adequacy of the method of atomic force microscopy for surface roughness measurements in a wide range of spatial frequencies are shown and the results of the studies of the effect of etching by argon and xenon ions on the surface roughness of fused quartz and optical ceramics, Zerodur, ULE and Sitall, are given. Substrates of fused quartz and ULE with the roughness, satisfying the requirements of diffraction-quality optics intended for working in the spectral range below 10 nm, are made.

Multilayer X-ray optics for synchrotron radiation

Abstract Layered synthetic nanostructures are considered both as normal incidence imaging and dispersive optical elements in the soft X-ray range and as filters of γ-radiation for Mossbauer spectroscopy.

Multilayer coated reflective optics for Extreme UV lithography

In this paper we present normal incidence reflectivity measurements of EUV reflective multilayer coatings for @l=13-14 nm, the wavelength of interest for EUV projection lithography. The multilayer coatings are produced by e-beam evaporation in combination with ionbombardment of the layers and by magnetron sputtering. These techniques are used for coating the mirrors of our Schwarzschild telescope. We show measurements of absolute EUV reflectivity and homogeneity of the layer thickness over the mirrors. Furthermore we discuss the matching of the centre wavelength of the reflectivity curves for each of the components of our projection system.