N. Tuğluoğlu

The modification of Schottky barrier height of Au/p-Si Schottky devices by perylene-diimide

Perylene-diimide (PDI) thin film was fabricated by spin coating method on p-Si single-crystal substrate to prepare Au/PDI/p-Si Schottky device. The electrical properties of the Au/PDI/p-Si Schottky device were investigated by current-voltage (I–V) measurements in the temperature range 80–300 K and room temperature capacitance-voltage (C–V) measurement. Results showed a rectification behavior. Junction parameters such as ideality factor (n), barrier height (ϕB0), series resistance (Rs) interface state density (Nss), built-in potential (Vbi), carrier concentration (NA), and the width of the depletion layer (WD) were obtained from the I–V and C–V measurements. The values of ideality factor (n) and barrier height (BH) for the Au/PDI/p-Si structure from the I–V measurements were obtained as 1.77 and 0.584 eV at 300 K, 7.78 and 0.176 eV at 80 K, respectively. It was seen that the BH value of 0.584 eV calculated for the Au/PDI/p-Si structure was significantly larger than the value of 0.34 eV of conventional Au/p...