Naoto Sano
Canon Inc.
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Publication
Featured researches published by Naoto Sano.
Proceedings of SPIE, the International Society for Optical Engineering | 2000
Naoto Sano; Kazuhiro Takahashi; Hitoshi Nakano; Akiyoshi Suzuki
As the 130 nm era is approaching, requirements for lithography are becoming more and more rigorous. We have developed a 193nm scanner for below 130nm geometries capable of handling either 200 mm or 300 mm wafers. This paper describes the lithography tool performance required for printing 130nm features, focusing on a new 193nm excimer laser exposure tool developed for that age.
Archive | 2001
Masakatsu Ota; Naoto Sano
Archive | 1991
Naoto Sano; Tsutomu Asahina
Archive | 1997
Tadahiro Ohmi; Naoto Sano; Yasuyuki Shirai
Archive | 1997
Naoto Sano; Chidane Ouchi
Archive | 1999
Naoto Sano
Archive | 1997
Tadahiro Ohmi; Yasuyuki Shirai; Naoto Sano
Archive | 1995
Masato Aketagawa; Naoto Sano
Archive | 1996
Tsutomu Asahina; Naoto Sano
Archive | 2001
Yoshiyuki Nagai; Naoto Sano
