Naoya Hayamizu
Toshiba
Network
Latest external collaboration on country level. Dive into details by clicking on the dots.
Publication
Featured researches published by Naoya Hayamizu.
Photomask and next-generation lithography mask technology. Conference | 2000
Hidehiro Watanabe; Kenji Masui; Akio Kosaka; Naoya Hayamizu; Akinori Iso; Hachiro Hiratsuka; Yoshiaki Minegishi; Fumiaki Shigemitsu
A new clustered configurational photomask cleaning system has been developed. Accepting the clustered configuration, we can be free from the heavy tank photomask cleaner which has a large footprint and has no flexibility for designing a cleaning recipe. Provided we need to introduce a new cleaning process unit, we can substitute the unit by disassembling an old one in the system. We can always keep our photomask cleaner up-to date with the system, and, we can obtain most effective cleaning result by the least efforts and the smallest expense. Using this cleaning system with an optimized cleaning recipe, we have achieved the cleaning result of less than one particle, greater than 0.2 micrometers , detected by KLA Starlight.
Archive | 1998
Isao Sawamoto; Kuniaki Yamada; Yoshinori Nishiki; Masashi Tanaka; Naoaki Sakurai; Naoya Hayamizu
Archive | 2001
Yoshiyuki Nagahara; Naoya Hayamizu; Naoaki Sakurai; Noriko Okoshi; Toshitaka Nonaka; Hiroaki Furuya
Archive | 2010
Hiroyuki Fukumizu; Naoya Hayamizu; Makiko Tange
Archive | 1998
Kuniaki Yamada; Seiichi Anzai; Masashi Tanaka; Takayuki Shimamune; Yoshinori Nishiki; Naoaki Sakurai; Naoya Hayamizu; Hiroshi Fujita
Archive | 2007
Katsuya Eguchi; Naoya Hayamizu; Hiroyuki Fukui
Archive | 2000
Yasushi Watanabe; Keiichiro Senda; Hiroshi Fujita; Naoya Hayamizu; Hideaki Hirabayashi
Archive | 2002
Naoya Hayamizu
Archive | 2008
Hiroyuki Fukumizu; Naoya Hayamizu; Makiko Taya; 真紀子 田家; 裕之 福水; 直哉 速水
Archive | 2006
Katsuya Eguchi; Hiroshi Fujita; Naoya Hayamizu; 勝哉 江口; 博 藤田; 直哉 速水
