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Dive into the research topics where Naoya Uchiyama is active.

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Featured researches published by Naoya Uchiyama.


Proceedings of SPIE | 2013

Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL

Takumi Toida; Akihiro Suzuki; Naoya Uchiyama; Takashi Makinoshima; Masaaki Takasuka; Takashi Sato; Masatoshi Echigo

In this paper, we report the development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL. The new xanthendiol derivatives were easily synthesized by the condensation of aldehydes and dihydroxyaromatic compounds. We found 13,13’-biphenyl-bis(13H-benzoxanthen-2,11-diol) was showed the good applicability to the raw material for the resist for EB/EUVL. The EB patterning result showed the resist containing xanthendiol derivative could resolve the 20 nm half-pitch pattern, and 15 nm half-pitch patterns were partially resolved.


Archive | 2012

Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method

Masatoshi Echigo; Go Higashihara; Naoya Uchiyama


Archive | 2012

Resin having fluorene structure and underlayer film-forming material for lithography

Go Higashihara; Naoya Uchiyama; Masatoshi Echigo


Archive | 2013

NAPHTHALENE-FORMALDEHYDE RESIN, NAPHTHALENE-FORMALDEHYDE RESIN WITH BONDS FORMED BY DEACETALIZATION, AND MODIFIED NAPHTHALENE-FORMALDEHYDE RESIN

Naoya Uchiyama; Go Higashihara; Masatoshi Echigo


Archive | 2013

ACIDIFIED MONO ALKYL NAPHTHALENE FORMALDEHYDE RESIN

Naoya Uchiyama; Go Higashihara; Masatoshi Echigo


Archive | 2012

PHENOLIC RESIN AND MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY

Naoya Uchiyama; Go Higashihara; Masatoshi Echigo


Archive | 2011

AROMATIC HYDROCARBON RESIN, UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, AND METHOD FOR FORMING MULTILAYER RESIST PATTERN

Go Higashihara; Naoya Uchiyama; Masatoshi Echigo


Archive | 2015

MATERIAL FOR FORMING UNDERLAYER FILM LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD

Masatoshi Echigo; Go Higashihara; Naoya Uchiyama


Archive | 2014

COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD

Masatoshi Echigo; Takashi Makinoshima; Naoya Uchiyama


Archive | 2012

RESIN HAVING FLUORENE STRUCTURE AND MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY

Go Higashihara; Naoya Uchiyama; Masatoshi Echigo

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