Natsumi Suehiro | Researchain

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Featured researches published by Natsumi Suehiro.

Archive | 2012

Colored photosensitive resin composition

Takanori Kudo; Yuko Nozaki; Kazuya Nagao; Yuki Nanjo; Hiroshi Okazaki; Yoshiaki Kinoshita; Seiya Masuda; Munirathna Padmanaban; Natsumi Suehiro

Archive | 1994

Positive-working radiation-sensitive mixture

Klaus Juergen Przybilla; Takanori Kudo; Seiya Masuda; Yoshiaki Kinoshita; Natsumi Suehiro; Munirathna Padmanaban; Hiroshi Okazaki; Hajime Endo; Ralph R. Dammel; Georg Pawlowski

Archive | 1996

Pattern forming material including photoacid and photobase generators for large exposure latitude

Takanori Kudo; Seiya Masuda; Yoshiaki Kinoshita; Klaus Juergen Przybilla; Natsumi Endo; Natsumi Suehiro; Hiroshi Okazaki

Journal of Photopolymer Science and Technology | 1995

Photodecomposable bases. A novel concept to stabilize chemically amplified resists.

Satoru Funato; Yoshiaki Kinoshita; Takanori Kudo; Seiya Masuda; Hiroshi Okazaki; Munirathna Padmanaban; Klaus Juergen Przybilla; Natsumi Suehiro; Georg Pawlowski

Archive | 1993

Positive type radiation sensitive mixture

Hajime Endo; Yoshiaki Kinoshita; Takanori Kudo; Yurugen Shibera Kurausu; Seiya Masuda; Padomanaban Munirachiyuna; Hiroshi Okazaki; Dameru Rarufu; Natsumi Suehiro; クラウス、ユルゲン、シベラ; ムニラチュナ、パドマナバン; ラルフ、ダメル

Archive | 1995

Radiation-sensitive mixture comprising a basic iodonium compound

Seiya Masuda; Munirathna Padmanaban; Takanori Kudo; Yoshiaki Kinoshita; Natsumi Suehiro; Yuko Nozaki; Hiroshi Okazaki; Klaus Jurgen Przybilla

Archive | 1996

Strahlungsempfindliche Zusammensetzung A radiation-sensitive composition

Munirathna Padmanaban; Yoshiaki Kinoshita; Satoru Funato; Natsumi Suehiro; Hiroshi Okazaki; Georg Pawlowski

Archive | 1995

Strahlungsempfindliche Mischung A radiation-sensitive mixture

Seiya Masuda; Munirathna Padmanaban; Takanori Kudo; Yoshiaki Kinoshita; Natsumi Suehiro; Yuko Nozaki; Hiroshi Okazaki; Klaus Juergen Przybilla

Archive | 1994

Positiv arbeitendes strahlungsempfindliches Gemisch A positive-working radiation-sensitive mixture

Klaus Juergen Przybilla; Ralph R. Dammel; Georg Pawlowski; Takanori Kudo; Seiya Masuda; Yoshiaki Kinoshita; Natsumi Suehiro; Munirathna Padmanaban; Hiroshi Okazaki; Hajime Endo

Archive | 1994