Is this you? Create Your Porfile
Avatar

Nishimura Yukio

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Nishimura Yukio is active.

Explore More

Publication

Featured researches published by Nishimura Yukio.

Archive | 2010

Polymer and radiation-sensitive resin composition

Nishimura Yukio; Matsuda Yasuhiko; Sakai Kaori; Sugiura Makoto

Archive | 2009

Radiation-sensitive resin composition, method for forming resist pattern and photoresist film

Matsumura Nobuji; Soyano Akimasa; Asano Yuusuke; Naruoka Takehiko; Sakakibara Hirokazu; Shimizu Makoto; Nishimura Yukio; Kasahara Kazuki; Nakagawa Hiroki; Sugiura Makoto; Shimokawa Tsutomu

Archive | 2002

SOLUTION OF RADIATION SENSITIVE RESIN COMPOSITION AND METHOD FOR IMPROVING SHELF STABILITY OF THE SAME

Kataoka Atsuko; Yamamoto Shigehiro; Nishimura Yukio; Kajita Toru

Archive | 2009

Positively radiation-sensitive composition and process for producing resist pattern using the same

Nishimura Yukio; Sakai Kaori; Matsumura Nobuji; Sugiura Makoto; Nakamura Atsushi; Wakamatsu Gouji; Anno Yuusuke

Archive | 2003

COPOLYMER, METHOD FOR MANUFACTURING THE SAME, AND RADIATION-SENSITIVE RESIN COMPOSITION

Nishimura Yukio; Nishimura Isao

Archive | 2012

UPPER LAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING PHOTORESIST PATTERN

Nakamura Atsushi; Nakagawa Daiki; Nakajima Hiromitsu; Tsuji Takayuki; Dokochi Hiroshi; Kono Hirota; Nishimura Yukio

Archive | 2003

LACTONE COPOLYMER RESIN AND RADIATION-SENSITIVE RESIN COMPOSITION

Miyamatsu Takashi; Ishii Hiroyuki; Nishimura Yukio; Soyano Akimasa

Archive | 2014

THERMOSETTING RESIN COMPOSITION FOR FORMING CURED FILM, RADIATION-SENSITIVE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, METHOD FOR FORMING THE SAME, SEMICONDUCTOR ELEMENT, AND DISPLAY ELEMENT

Mishima Eri; Nishimura Yukio; Shimokawa Tsutomu; Yashiro Takao

Archive | 2010

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND BLOCK COPOLYMER

Asano Yusuke; Nishimura Yukio; Kawakami Mineki; Matsumura Shinji; Sakakibara Hirokazu; Naruoka Takehiko

Archive | 2010

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER USABLE THEREFOR AND COMPOUND USABLE THEREFOR

Matsumura Shinji; Nishimura Yukio; Soyano Akimasa; Serizawa Ryuichi

Explore More

Collaboration

Dive into the Nishimura Yukio's collaboration.

Top Co-Authors
Avatar

Naruoka Takehiko

Tokyo Electron

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge