O. Auciello

The Physics of Ferroelectric Memories

Imagine you are in the last stages of typing your thesis, the year is 1980, and its a hot, hazy summer afternoon, a thunderstorm brews on the horizon. Tense and tired, you have forgotten to save the document on your hard disk. Suddenly, lightning strikes! Your computer shuts down. Your final chapter is lost.

Synthesis and characterization of highly-conducting nitrogen-doped ultrananocrystalline diamond films

Ultrananocrystalline diamond (UNCD) films with up to 0.2% total nitrogen content were synthesized by a microwave plasma-enhanced chemical-vapor-deposition method using a CH4(1%)/Ar gas mixture and 1%–20% nitrogen gas added. The electrical conductivity of the nitrogen-doped UNCD films increases by five orders of magnitude (up to 143 Ω−1 cm−1) with increasing nitrogen content. Conductivity and Hall measurements made as a function of film temperature down to 4.2 K indicate that these films have the highest n-type conductivity and carrier concentration demonstrated for phase-pure diamond thin films. Grain-boundary conduction is proposed to explain the remarkable transport properties of these films.

Ultrananocrystalline diamond thin films for MEMS and moving mechanical assembly devices

MEMS devices are currently fabricated primarily in silicon because of the available surface machining technology. A major problem with the Si-based MEMS technology is that Si has poor mechanical and tribological properties J.J. Sniegowski, in: B.

Composition-control of magnetron-sputter-deposited (BaxSr1 - X)Ti1 + yO3 + z thin films for voltage tunable devices

Precise control of composition and microstructure is critical for the production of (BaxSr1−x)Ti1+yO3+z (BST) dielectric thin films with the large dependence of permittivity on electric field, low losses, and high electrical breakdown fields that are required for successful integration of BST into tunable high-frequency devices. Here, we present results on composition-microstructure-electrical property relationships for polycrystalline BST films produced by magnetron-sputter deposition, that are appropriate for microwave and millimeter-wave applications such as varactors and frequency triplers. Films with controlled compositions were grown from a stoichiometric Ba0.5Sr0.5TiO3 target by control of the background processing gas pressure. It was determined that the (Ba+Sr)/Ti ratios of these BST films could be adjusted from 0.73 to 0.98 by changing the total (Ar+O2) process pressure, while the O2/Ar ratio did not strongly affect the metal ion composition. Film crystalline structure and dielectric properties ...

Science and technology of ferroelectric films and heterostructures for non-volatile ferroelectric memories.

We present in this article a review of the status of thin film ferroelectric materials for nonvolatile memories. Key materials issues relevant to the integration of these materials on Si wafers are discussed. The effect of film microstructure and electrode defect chemistry on the ferroelectric properties relevant to a high density nonvolatile memory technology are discussed. The second part of this review focuses on approaches to integrate these capacitor structures on a filled poly-Si plug which is a critical requirement for a high density memory technology. Finally, the use of novel surface probes to study and understand broadband polarization dynamics in ferroelectric thin films is also presented.

Bonding structure in nitrogen doped ultrananocrystalline diamond

The transport properties of diamond thin films are well known to be sensitive to the sp2/sp3-bonded carbon ratio, the presence of the grain boundaries and other defects, and to the presence of various impurities. In order to clarify the roles these factors play in the conduction mechanisms of nitrogen-doped ultrananocrystalline diamond (UNCD), Raman scattering, near edge x-ray absorption fine structure (NEXAFS), soft x-ray fluorescence (SXF), and secondary ion mass spectroscopy (SIMS) measurements were performed. Transmission electron microscopy analysis of nitrogen doped UNCD has previously indicated that the films are composed of crystalline diamond nano-grains with boundaries of amorphous carbon, and NEXAFS measurements reveal that the global amount of sp2-bonded carbon in these films increases slightly with nitrogen doping. The nitrogen content is quantified with high-resolution SIMS analysis, while NEXAFS and SXF indicates that the nitrogen exists primarily in tetrahedrally coordinated sites. These m...

Low temperature growth of ultrananocrystalline diamond

Ultrananocrystalline diamond (UNCD) films were prepared by microwave plasma chemical vapor deposition using argon-rich Ar∕CH4 plasmas at substrate temperatures from ∼400 to 800°C. Different seeding processes were employed to enhance the initial nucleation density for UNCD growth to about 1011sites∕cm2. High-resolution transmission electron microscopy, near-edge x-ray absorption fine structure, visible and ultraviolet Raman spectroscopy, and scanning electron microscopy were used to study the bonding structure as a function of growth temperature. The results showed that the growth of UNCD films is much less dependent on substrate temperature than for hydrogen-based CH4∕H2 plasmas. UNCD with nearly the same nanoscale structure as those characteristic of high-temperature deposition can be grown at temperatures as low as 400°C with growth rates of about 0.2μm∕hr. The average grain size increased to about 8nm from 3 to 5nm that is characteristic of high-temperature growth, but the relative amounts of sp3 and s...

Nanoscale imaging of domain dynamics and retention in ferroelectric thin films

We report results on the direct observation of the microscopic origins of backswitching in ferroelectric thin films. The piezoelectric response generated in the film by a biased atomic force microscope tip was used to obtain static and dynamic piezoelectric images of individual grains in a polycrystalline material. We demonstrate that polarization reversal occurs under no external field (i.e., loss of remanent polarization) via a dispersive continuous-time random walk process, identified by a stretched exponential decay of the remanent polarization.

Electron field emission for ultrananocrystalline diamond films

Ultrananocrystalline diamond (UNCD) films 0.1–2.4 μm thick were conformally deposited on sharp single Si microtip emitters, using microwave CH4–Ar plasma-enhanced chemical vapor deposition in combination with a dielectrophoretic seeding process. Field-emission studies exhibited stable, extremely high (60–100 μA/tip) emission current, with little variation in threshold fields as a function of film thickness or Si tip radius. The electron emission properties of high aspect ratio Si microtips, coated with diamond using the hot filament chemical vapor deposition (HFCVD) process were found to be very different from those of the UNCD-coated tips. For the HFCVD process, there is a strong dependence of the emission threshold on both the diamond coating thickness and Si tip radius. Quantum photoyield measurements of the UNCD films revealed that these films have an enhanced density of states within the bulk diamond band gap that is correlated with a reduction in the threshold field for electron emission. In additio...

Morphology and electronic structure in nitrogen-doped ultrananocrystalline diamond

Ultrananocrystalline diamond (UNCD) thin films consist of 2–5 nm grains of pure sp3-bonded carbon and ∼0.5-nm-wide grain boundaries with a disordered mixture of sp2- and sp3-bonded carbon. UNCD exhibits many interesting materials properties that are a direct consequence of its nanoscale morphology. In this work, we report the changes in morphology induced in UNCD by the addition of nitrogen gas to the Ar/CH4 microwave plasma, as studied using high-resolution transmission electron microscopy and nanoprobe-based electron energy-loss spectroscopy. Both the grain size and grain-boundary widths increase with the addition of N2, but the overall bonding structure in both regions remains mostly unchanged. These results are used to explain the variation of materials properties of nitrogen-incorporated UNCD films.